CHARGED PARTICLE BEAM LITHOGRAPHY DEVICE AND CHARGED PARTICLE BEAM LITHOGRAPHY METHOD

PROBLEM TO BE SOLVED: To provide a charged particle beam lithography device and a charged particle beam lithography method capable of enhancing the drawing accuracy by reducing the in-plane temperature difference of a sample.SOLUTION: An electron beam lithography device includes a load lock chamber provided for introducing a sample 21 externally, and capable of switching between atmospheric state and vacuum state, a transfer chamber communicable with the load lock chamber and transferring the sample 21, a constant temperature chamber 17 communicable with the transfer chamber, and having a temperature control container 19 for housing the sample 21 and controlling the temperature of the sample 21 by radiation, and a temperature control section 22 for controlling the temperature of the temperature control container 19, and a drawing chamber communicable with the transfer chamber, and performing the drawing of the sample 21 subjected to temperature uniformization. 【課題】試料の面内温度差を小さくし、描画精度の向上を図ることができる荷電粒子ビーム描画装置及び荷電粒子ビーム描画方法を提供する。【解決手段】電子ビーム描画装置は、試料２１を外部より導入するために設けられ、大気状態と真空状態とを切り替えることが可能なロードロックチャンバと、このロードロックチャンバと連通可能であり、試料２１の搬送を行う搬送チャンバと、搬送チャンバと連通可能であり、試料２１を収納し輻射により試料２１の温度を制御する温調用容器１９と、温調用容器１９の温度を制御するための温調部２２と、を有する恒温化チャンバ１７と、搬送チャンバと連通可能であり、恒温化された試料２１に対して描画を行う描画チャンバと、を備える。【選択図】図２