BASE MATERIAL FOR CONDUCTIVE PATTERN TRANSFER AND CONDUCTIVE PATTERN TRANSFER METHOD

PROBLEM TO BE SOLVED: To provide a base material for conductive pattern transfer which easily forms and holds a conductive pattern on the base material and is used for transferring the held conductive pattern to a body to be transferred having adhesiveness, and also to provide a transfer method.SOLU...

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creator SHINO SHIGEKI
description PROBLEM TO BE SOLVED: To provide a base material for conductive pattern transfer which easily forms and holds a conductive pattern on the base material and is used for transferring the held conductive pattern to a body to be transferred having adhesiveness, and also to provide a transfer method.SOLUTION: Disclosed is a base material for conductive pattern transfer which holds a conductive pattern and is used for transferring the held conductive pattern to a body to be transferred. The base material for the conductive pattern transfer is characterized by having at least a porous layer on a support body and a layer containing colloidal silica as a main component on the porous layer.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2014192275A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2014192275A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2014192275A3</originalsourceid><addsrcrecordid>eNrjZAhxcgx2VfB1DHEN8nT0UXDzD1Jw9vdzCXUO8QxzVQhwDAFK-CmEBDn6Bbu5Bik4-rnglfd1DfHwd-FhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGhiaGlkZG5qaOxkQpAgCeZzDE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>BASE MATERIAL FOR CONDUCTIVE PATTERN TRANSFER AND CONDUCTIVE PATTERN TRANSFER METHOD</title><source>esp@cenet</source><creator>SHINO SHIGEKI</creator><creatorcontrib>SHINO SHIGEKI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a base material for conductive pattern transfer which easily forms and holds a conductive pattern on the base material and is used for transferring the held conductive pattern to a body to be transferred having adhesiveness, and also to provide a transfer method.SOLUTION: Disclosed is a base material for conductive pattern transfer which holds a conductive pattern and is used for transferring the held conductive pattern to a body to be transferred. The base material for the conductive pattern transfer is characterized by having at least a porous layer on a support body and a layer containing colloidal silica as a main component on the porous layer.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CABLES ; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ; CONDUCTORS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INSULATORS ; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS ; PRINTED CIRCUITS ; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES ; SEMICONDUCTOR DEVICES</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20141006&amp;DB=EPODOC&amp;CC=JP&amp;NR=2014192275A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25553,76306</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20141006&amp;DB=EPODOC&amp;CC=JP&amp;NR=2014192275A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHINO SHIGEKI</creatorcontrib><title>BASE MATERIAL FOR CONDUCTIVE PATTERN TRANSFER AND CONDUCTIVE PATTERN TRANSFER METHOD</title><description>PROBLEM TO BE SOLVED: To provide a base material for conductive pattern transfer which easily forms and holds a conductive pattern on the base material and is used for transferring the held conductive pattern to a body to be transferred having adhesiveness, and also to provide a transfer method.SOLUTION: Disclosed is a base material for conductive pattern transfer which holds a conductive pattern and is used for transferring the held conductive pattern to a body to be transferred. The base material for the conductive pattern transfer is characterized by having at least a porous layer on a support body and a layer containing colloidal silica as a main component on the porous layer.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CABLES</subject><subject>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</subject><subject>CONDUCTORS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INSULATORS</subject><subject>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</subject><subject>PRINTED CIRCUITS</subject><subject>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZAhxcgx2VfB1DHEN8nT0UXDzD1Jw9vdzCXUO8QxzVQhwDAFK-CmEBDn6Bbu5Bik4-rnglfd1DfHwd-FhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGhiaGlkZG5qaOxkQpAgCeZzDE</recordid><startdate>20141006</startdate><enddate>20141006</enddate><creator>SHINO SHIGEKI</creator><scope>EVB</scope></search><sort><creationdate>20141006</creationdate><title>BASE MATERIAL FOR CONDUCTIVE PATTERN TRANSFER AND CONDUCTIVE PATTERN TRANSFER METHOD</title><author>SHINO SHIGEKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2014192275A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2014</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CABLES</topic><topic>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</topic><topic>CONDUCTORS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INSULATORS</topic><topic>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</topic><topic>PRINTED CIRCUITS</topic><topic>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>SHINO SHIGEKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHINO SHIGEKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>BASE MATERIAL FOR CONDUCTIVE PATTERN TRANSFER AND CONDUCTIVE PATTERN TRANSFER METHOD</title><date>2014-10-06</date><risdate>2014</risdate><abstract>PROBLEM TO BE SOLVED: To provide a base material for conductive pattern transfer which easily forms and holds a conductive pattern on the base material and is used for transferring the held conductive pattern to a body to be transferred having adhesiveness, and also to provide a transfer method.SOLUTION: Disclosed is a base material for conductive pattern transfer which holds a conductive pattern and is used for transferring the held conductive pattern to a body to be transferred. The base material for the conductive pattern transfer is characterized by having at least a porous layer on a support body and a layer containing colloidal silica as a main component on the porous layer.</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
CABLES
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
CONDUCTORS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
INSULATORS
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
PRINTED CIRCUITS
SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES
SEMICONDUCTOR DEVICES
title BASE MATERIAL FOR CONDUCTIVE PATTERN TRANSFER AND CONDUCTIVE PATTERN TRANSFER METHOD
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-15T08%3A09%3A52IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SHINO%20SHIGEKI&rft.date=2014-10-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2014192275A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true