ILLUMINATION APPARATUS AND PROJECTOR

PROBLEM TO BE SOLVED: To provide an illumination apparatus capable of suppressing the occurrence of speckle and scintillation.SOLUTION: The illumination apparatus includes a light source emitting a first luminous flux and a second luminous flux, a diffraction optical element 18 including first areas...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	UEJIMA SHUNJI, EGAWA AKIRA
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM BLASTING CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTROGRAPHY FREQUENCY-CHANGING HEATING HOLOGRAPHY INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21Sand F21V, RELATING TO THEFORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THELIGHT EMITTED LIGHTING MECHANICAL ENGINEERING NON-LINEAR OPTICS NON-PORTABLE LIGHTING DEVICES OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICAL LOGIC ELEMENTS OPTICS PHOTOGRAPHY PHYSICS SYSTEMS THEREOF TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF VEHICLE LIGHTING DEVICES SPECIALLY ADAPTED FOR VEHICLEEXTERIORS WEAPONS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an illumination apparatus capable of suppressing the occurrence of speckle and scintillation.SOLUTION: The illumination apparatus includes a light source emitting a first luminous flux and a second luminous flux, a diffraction optical element 18 including first areas 30a to 30i on which the first luminous flux is made incident and second areas 30a to 30i on which the second luminous flux is made incident, a superposition optical system superposing diffraction light emitted from the first areas 30a to 30i on diffraction light emitted from the second areas 30a to 30i, and an incident position switching mechanism 40 moving a position on which the first luminous flux is made incident in the first areas 30a to 30i and moving a position on which the second luminous flux is made incident in the second areas 30a to 30i. The first areas 30a to 30i have a plurality of first sub-areas 31a to 31i whose diffraction element patterns are different form each other and the second areas 30a to 30i have a plurality of second sub-areas 31a to 31i whose diffraction element patterns are different from each other.