SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME

PROBLEM TO BE SOLVED: To achieve downsizing of a semiconductor device in which a cap wafer is bonded to a device wafer.SOLUTION: A semiconductor device manufacturing method comprises: forming an oxide film 64 on one surface 61 of a semiconductor substrate 63 before forming a cavity 66; and forming t...

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Bibliographische Detailangaben
1. Verfasser: MURATA TOMOYUKI
Format: Patent
Sprache:eng
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