HIGH DIELECTRIC FILM

PROBLEM TO BE SOLVED: To provide a film having high dielectric constant and low dielectric tangent.SOLUTION: The high dielectric film includes vinylidene fluoride/tetrafluoroethylene copolymer (A) having a vinylidene fluoride/tetrafluoroethylene molar ratio of 95/5 to 80/20, being composed of an α-t...

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Hauptverfasser:	IGUCHI TAKASHI, KOTANI TETSUHIRO, KOMATSU NOBUYUKI, UCHIDA KAZUNOBU, YOKOYA KOJI, SHIGEUCHI FUMIKO, KITAHARA TAKAHIRO, OTA YOSHIHARU, FUKATANI TOMOYUKI, HAZAMA TAKESHI, KINOSHITA MASAKAZU, KO MEITEN, TATEMICHI MAYUKO, ISHIKAWA TAKUJI, NAKAMURA NAOKO
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON GENERAL PROCESSES OF COMPOUNDING MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP
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Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a film having high dielectric constant and low dielectric tangent.SOLUTION: The high dielectric film includes vinylidene fluoride/tetrafluoroethylene copolymer (A) having a vinylidene fluoride/tetrafluoroethylene molar ratio of 95/5 to 80/20, being composed of an α-type crystal structure and a -type crystal structure, with the -type crystal structure being 50% or more.