SUBSTRATE THERMAL TREATMENT APPARATUS, SUBSTRATE THERMAL TREATMENT METHOD, AND RECORDING MEDIUM FOR SUBSTRATE THERMAL TREATMENT

PROBLEM TO BE SOLVED: To provide a device and a method which perform thermal treatment on a substrate in sufficiently uniform temperature distribution, and to provide a recording medium.SOLUTION: A heating/cooling unit U2 includes: a heat plate 10 which supports a wafer W horizontally placed and hea...

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Hauptverfasser:	TSURUTA TOYOHISA, KYODA HIDEJI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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