VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD

PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus and a vacuum processing method which allow for efficient transfer of a substrate, while preventing a substrate from being left in a processing chamber for a long time after finishing the processing.SOLUTION: When transfer of a substrate,...

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Bibliographische Detailangaben

Hauptverfasser:	DEWA HIROAKI, UOYAMA KAZUYA
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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