MASK BLANK AND PHOTOMASK

PROBLEM TO BE SOLVED: To provide a mask blank capable of manufacturing a photomask having a structure effectively preventing electrostatic breakdown.SOLUTION: An electrostatic breakdown preventive film 2 is formed to cover the entire surface of one side of a mask substrate 1, and a light-shielding f...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	HATTORI ISAO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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