PROCESSING APPARATUS
PROBLEM TO BE SOLVED: To reduce the possibility of adhesion of foreign matter and prevent deterioration of suction force of a fan by separating waste fluid of a processing fluid mixed with exhaust gas from a processing chamber from the exhaust gas.SOLUTION: A processing apparatus is provided with an...
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| creator | TERASHI KENTARO KIYOKAWA SATOSHI |
| description | PROBLEM TO BE SOLVED: To reduce the possibility of adhesion of foreign matter and prevent deterioration of suction force of a fan by separating waste fluid of a processing fluid mixed with exhaust gas from a processing chamber from the exhaust gas.SOLUTION: A processing apparatus is provided with an exhaust passage communicating with the processing chamber at one end and with the fan at the other end to discharge an atmosphere of the inside of the processing chamber and separation means of separating, from the exhaust gas, waste fluid containing processed waste and contained in exhaust gas. The separation means comprises a separation chamber 54, a suction port 58 communicating with the processing chamber, a discharge port 60 communicating with the fan, a waste fluid discharge port 62 formed at the lower end of the separation chamber, and a waste fluid discharge passage 68 connected to the waste fluid discharge port. The waste fluid contained in the exhaust gas is discharged through the waste fluid discharge port into the waste fluid discharge passage by a swirling air flow produced in the separation chamber by the exhaust gas sucked from the suction port, and the exhaust gas is discharged through the gas discharge port. A water-sealing part 72 is formed in the waste fluid discharge passage to prevent back flow of the gas toward the fan in the waste fluid discharge passage. |
| format | Patent |
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The separation means comprises a separation chamber 54, a suction port 58 communicating with the processing chamber, a discharge port 60 communicating with the fan, a waste fluid discharge port 62 formed at the lower end of the separation chamber, and a waste fluid discharge passage 68 connected to the waste fluid discharge port. The waste fluid contained in the exhaust gas is discharged through the waste fluid discharge port into the waste fluid discharge passage by a swirling air flow produced in the separation chamber by the exhaust gas sucked from the suction port, and the exhaust gas is discharged through the gas discharge port. A water-sealing part 72 is formed in the waste fluid discharge passage to prevent back flow of the gas toward the fan in the waste fluid discharge passage.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; SEMICONDUCTOR DEVICES ; TRANSPORTING</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140508&DB=EPODOC&CC=JP&NR=2014079822A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140508&DB=EPODOC&CC=JP&NR=2014079822A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TERASHI KENTARO</creatorcontrib><creatorcontrib>KIYOKAWA SATOSHI</creatorcontrib><title>PROCESSING APPARATUS</title><description>PROBLEM TO BE SOLVED: To reduce the possibility of adhesion of foreign matter and prevent deterioration of suction force of a fan by separating waste fluid of a processing fluid mixed with exhaust gas from a processing chamber from the exhaust gas.SOLUTION: A processing apparatus is provided with an exhaust passage communicating with the processing chamber at one end and with the fan at the other end to discharge an atmosphere of the inside of the processing chamber and separation means of separating, from the exhaust gas, waste fluid containing processed waste and contained in exhaust gas. The separation means comprises a separation chamber 54, a suction port 58 communicating with the processing chamber, a discharge port 60 communicating with the fan, a waste fluid discharge port 62 formed at the lower end of the separation chamber, and a waste fluid discharge passage 68 connected to the waste fluid discharge port. The waste fluid contained in the exhaust gas is discharged through the waste fluid discharge port into the waste fluid discharge passage by a swirling air flow produced in the separation chamber by the exhaust gas sucked from the suction port, and the exhaust gas is discharged through the gas discharge port. A water-sealing part 72 is formed in the waste fluid discharge passage to prevent back flow of the gas toward the fan in the waste fluid discharge passage.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAJCPJ3dg0O9vRzV3AMCHAMcgwJDeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGhiYG5pYWRkaOxkQpAgDJFR9D</recordid><startdate>20140508</startdate><enddate>20140508</enddate><creator>TERASHI KENTARO</creator><creator>KIYOKAWA SATOSHI</creator><scope>EVB</scope></search><sort><creationdate>20140508</creationdate><title>PROCESSING APPARATUS</title><author>TERASHI KENTARO ; KIYOKAWA SATOSHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2014079822A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2014</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>TERASHI KENTARO</creatorcontrib><creatorcontrib>KIYOKAWA SATOSHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TERASHI KENTARO</au><au>KIYOKAWA SATOSHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PROCESSING APPARATUS</title><date>2014-05-08</date><risdate>2014</risdate><abstract>PROBLEM TO BE SOLVED: To reduce the possibility of adhesion of foreign matter and prevent deterioration of suction force of a fan by separating waste fluid of a processing fluid mixed with exhaust gas from a processing chamber from the exhaust gas.SOLUTION: A processing apparatus is provided with an exhaust passage communicating with the processing chamber at one end and with the fan at the other end to discharge an atmosphere of the inside of the processing chamber and separation means of separating, from the exhaust gas, waste fluid containing processed waste and contained in exhaust gas. The separation means comprises a separation chamber 54, a suction port 58 communicating with the processing chamber, a discharge port 60 communicating with the fan, a waste fluid discharge port 62 formed at the lower end of the separation chamber, and a waste fluid discharge passage 68 connected to the waste fluid discharge port. The waste fluid contained in the exhaust gas is discharged through the waste fluid discharge port into the waste fluid discharge passage by a swirling air flow produced in the separation chamber by the exhaust gas sucked from the suction port, and the exhaust gas is discharged through the gas discharge port. A water-sealing part 72 is formed in the waste fluid discharge passage to prevent back flow of the gas toward the fan in the waste fluid discharge passage.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS DRESSING OR CONDITIONING OF ABRADING SURFACES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING SEMICONDUCTOR DEVICES TRANSPORTING |
| title | PROCESSING APPARATUS |
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