METHOD AND APPARATUS FOR FORMING PATTERN, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DISPLAY PANEL
PROBLEM TO BE SOLVED: To form a pattern over the entire surface of a substrate with almost uniform luminous energy of exposure light by dispersing positions of drawing centers of mirrors in the respective beam irradiation regions without inducing periodicity.SOLUTION: A light beam irradiation appara...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | MOCHIZUKI MASAAKI HONDA HIDEYUKI |
| description | PROBLEM TO BE SOLVED: To form a pattern over the entire surface of a substrate with almost uniform luminous energy of exposure light by dispersing positions of drawing centers of mirrors in the respective beam irradiation regions without inducing periodicity.SOLUTION: A light beam irradiation apparatus is provided, in which a substrate coated with a photoresist is irradiated with a light beam to draw a pattern on the basis of drawing data by use of a spatial optical modulator having a plurality of mirrors arranged in two directions. In a pattern forming method, the substrate is relatively scanned by the light beam irradiation apparatus, and positions of drawing centers of the mirrors in a given drawing region are dispersed so as not induce periodicity in the distribution. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2014071350A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2014071350A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2014071350A3</originalsourceid><addsrcrecordid>eNrjZMjwdQ3x8HdRcPQD4oAAxyDHkNBgBTf_IBD29fRzVwhwDAlxDfLTUXCNCPAPDg1yRajTAWuDmgDS4-voF-rm6BwSGgTS6eIZHODjGAk0wc_Vh4eBNS0xpziVF0pzMyi5uYY4e-imFuTHpxYXJCan5qWWxHsFGBkYmhiYGxqbGjgaE6UIAIulNgY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD AND APPARATUS FOR FORMING PATTERN, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DISPLAY PANEL</title><source>esp@cenet</source><creator>MOCHIZUKI MASAAKI ; HONDA HIDEYUKI</creator><creatorcontrib>MOCHIZUKI MASAAKI ; HONDA HIDEYUKI</creatorcontrib><description>PROBLEM TO BE SOLVED: To form a pattern over the entire surface of a substrate with almost uniform luminous energy of exposure light by dispersing positions of drawing centers of mirrors in the respective beam irradiation regions without inducing periodicity.SOLUTION: A light beam irradiation apparatus is provided, in which a substrate coated with a photoresist is irradiated with a light beam to draw a pattern on the basis of drawing data by use of a spatial optical modulator having a plurality of mirrors arranged in two directions. In a pattern forming method, the substrate is relatively scanned by the light beam irradiation apparatus, and positions of drawing centers of the mirrors in a given drawing region are dispersed so as not induce periodicity in the distribution.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; FREQUENCY-CHANGING ; HOLOGRAPHY ; MATERIALS THEREFOR ; NON-LINEAR OPTICS ; OPTICAL ANALOGUE/DIGITAL CONVERTERS ; OPTICAL LOGIC ELEMENTS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES ; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140421&DB=EPODOC&CC=JP&NR=2014071350A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140421&DB=EPODOC&CC=JP&NR=2014071350A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MOCHIZUKI MASAAKI</creatorcontrib><creatorcontrib>HONDA HIDEYUKI</creatorcontrib><title>METHOD AND APPARATUS FOR FORMING PATTERN, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DISPLAY PANEL</title><description>PROBLEM TO BE SOLVED: To form a pattern over the entire surface of a substrate with almost uniform luminous energy of exposure light by dispersing positions of drawing centers of mirrors in the respective beam irradiation regions without inducing periodicity.SOLUTION: A light beam irradiation apparatus is provided, in which a substrate coated with a photoresist is irradiated with a light beam to draw a pattern on the basis of drawing data by use of a spatial optical modulator having a plurality of mirrors arranged in two directions. In a pattern forming method, the substrate is relatively scanned by the light beam irradiation apparatus, and positions of drawing centers of the mirrors in a given drawing region are dispersed so as not induce periodicity in the distribution.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>FREQUENCY-CHANGING</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>NON-LINEAR OPTICS</subject><subject>OPTICAL ANALOGUE/DIGITAL CONVERTERS</subject><subject>OPTICAL LOGIC ELEMENTS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZMjwdQ3x8HdRcPQD4oAAxyDHkNBgBTf_IBD29fRzVwhwDAlxDfLTUXCNCPAPDg1yRajTAWuDmgDS4-voF-rm6BwSGgTS6eIZHODjGAk0wc_Vh4eBNS0xpziVF0pzMyi5uYY4e-imFuTHpxYXJCan5qWWxHsFGBkYmhiYGxqbGjgaE6UIAIulNgY</recordid><startdate>20140421</startdate><enddate>20140421</enddate><creator>MOCHIZUKI MASAAKI</creator><creator>HONDA HIDEYUKI</creator><scope>EVB</scope></search><sort><creationdate>20140421</creationdate><title>METHOD AND APPARATUS FOR FORMING PATTERN, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DISPLAY PANEL</title><author>MOCHIZUKI MASAAKI ; HONDA HIDEYUKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2014071350A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2014</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>FREQUENCY-CHANGING</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>NON-LINEAR OPTICS</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><toplevel>online_resources</toplevel><creatorcontrib>MOCHIZUKI MASAAKI</creatorcontrib><creatorcontrib>HONDA HIDEYUKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MOCHIZUKI MASAAKI</au><au>HONDA HIDEYUKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD AND APPARATUS FOR FORMING PATTERN, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DISPLAY PANEL</title><date>2014-04-21</date><risdate>2014</risdate><abstract>PROBLEM TO BE SOLVED: To form a pattern over the entire surface of a substrate with almost uniform luminous energy of exposure light by dispersing positions of drawing centers of mirrors in the respective beam irradiation regions without inducing periodicity.SOLUTION: A light beam irradiation apparatus is provided, in which a substrate coated with a photoresist is irradiated with a light beam to draw a pattern on the basis of drawing data by use of a spatial optical modulator having a plurality of mirrors arranged in two directions. In a pattern forming method, the substrate is relatively scanned by the light beam irradiation apparatus, and positions of drawing centers of the mirrors in a given drawing region are dispersed so as not induce periodicity in the distribution.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JP2014071350A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FREQUENCY-CHANGING HOLOGRAPHY MATERIALS THEREFOR NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF |
| title | METHOD AND APPARATUS FOR FORMING PATTERN, EXPOSURE APPARATUS, AND METHOD FOR MANUFACTURING DISPLAY PANEL |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-14T14%3A40%3A17IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MOCHIZUKI%20MASAAKI&rft.date=2014-04-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2014071350A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |