APPARATUS AND METHODS FOR DETECTING OVERLAY ERRORS USING SCATTEROMETRY

PROBLEM TO BE SOLVED: To provide methods for determining overlay errors between two layers of a sample comprising a plurality of layers.SOLUTION: For each of a plurality of periodic targets that each have a first structure formed from a first layer of a sample, and a second structure formed from a s...

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Hauptverfasser:	MARK GINOVKER, NOAM KNOLL, JOHN FIELDEN, BORIS GOLOVANEVSKY, PAOLA DECECCO, ANATOLY FABRIKANT, ZARIKI PIOTR, MICHAEL FRIEDMAN, MOSHE BAROUCH, CHRISTOPHER F BEVIS, WHACK DANG, ADELE MICHAEL, BECKETT NOAH, IAN SMITH, MIEHER WALTER D, KENNETH P GROSS, LEWI ADY
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
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