MICROLITHOGRAPHY PROJECTION OPTICAL SYSTEM, DEVICE AND MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a microlithography projection optical system, in particular, a projection objective system, a microlithography tool including the optical system, a microlithography manufacturing method for a fine structure constituent element employing the microlithography tool, and...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	HANS-JUERGEN MANN, WILHELM ULRICH
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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