APPARATUS FOR MEASURING DRYING RATE AND METHOD FOR MEASURING DRYING RATE USING THE SAME

PROBLEM TO BE SOLVED: To provide an apparatus for measuring a drying rate and a method for measuring a drying rate using the same in order to measure the drying rate of a substrate material in manufacturing an electronic apparatus.SOLUTION: The apparatus for measuring a drying rate may include a sup...

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Bibliographische Detailangaben
Hauptverfasser: SHIN DONG JOO, KIM SUNG HYUN, CHUN HEE SUN, JANG JUNG YONG, LEE CHOON KEUN, CHO JAE CHOON
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an apparatus for measuring a drying rate and a method for measuring a drying rate using the same in order to measure the drying rate of a substrate material in manufacturing an electronic apparatus.SOLUTION: The apparatus for measuring a drying rate may include a support part having a substrate seated thereon; and a marking part disposed above the substrate while being vertically and horizontally movable, and forming a marking on the substrate while being in contact with the substrate.