IMMERSION LITHOGRAPHY FLUID CONTROL SYSTEM
PROBLEM TO BE SOLVED: To provide a fluid control device capable of preventing fluid from moving away from an intentionally limited region in an immersion lithography apparatus, and preventing the fluid from entering a specific peripheral region outside an exposure region.SOLUTION: In an immersion li...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | COON DEREK HAZELTON ANDREW J |
| description | PROBLEM TO BE SOLVED: To provide a fluid control device capable of preventing fluid from moving away from an intentionally limited region in an immersion lithography apparatus, and preventing the fluid from entering a specific peripheral region outside an exposure region.SOLUTION: In an immersion lithography fluid control system, high pressure gas is used for a fluid control device 25 that holds immersion fluid in an exposure region 40 and a region in the vicinity of the same in a gap between an optical element 4, such as a lens, and a work piece (W) arranged in opposition to an optical member. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2014013939A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2014013939A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2014013939A3</originalsourceid><addsrcrecordid>eNrjZNDy9PV1DQr29PdT8PEM8fB3D3IM8IhUcPMJ9XRRcPb3Cwny91EIjgwOcfXlYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBoYmBobGlsaWjsZEKQIAxWklfQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>IMMERSION LITHOGRAPHY FLUID CONTROL SYSTEM</title><source>esp@cenet</source><creator>COON DEREK ; HAZELTON ANDREW J</creator><creatorcontrib>COON DEREK ; HAZELTON ANDREW J</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a fluid control device capable of preventing fluid from moving away from an intentionally limited region in an immersion lithography apparatus, and preventing the fluid from entering a specific peripheral region outside an exposure region.SOLUTION: In an immersion lithography fluid control system, high pressure gas is used for a fluid control device 25 that holds immersion fluid in an exposure region 40 and a region in the vicinity of the same in a gap between an optical element 4, such as a lens, and a work piece (W) arranged in opposition to an optical member.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2014</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140123&DB=EPODOC&CC=JP&NR=2014013939A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20140123&DB=EPODOC&CC=JP&NR=2014013939A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>COON DEREK</creatorcontrib><creatorcontrib>HAZELTON ANDREW J</creatorcontrib><title>IMMERSION LITHOGRAPHY FLUID CONTROL SYSTEM</title><description>PROBLEM TO BE SOLVED: To provide a fluid control device capable of preventing fluid from moving away from an intentionally limited region in an immersion lithography apparatus, and preventing the fluid from entering a specific peripheral region outside an exposure region.SOLUTION: In an immersion lithography fluid control system, high pressure gas is used for a fluid control device 25 that holds immersion fluid in an exposure region 40 and a region in the vicinity of the same in a gap between an optical element 4, such as a lens, and a work piece (W) arranged in opposition to an optical member.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2014</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNDy9PV1DQr29PdT8PEM8fB3D3IM8IhUcPMJ9XRRcPb3Cwny91EIjgwOcfXlYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBoYmBobGlsaWjsZEKQIAxWklfQ</recordid><startdate>20140123</startdate><enddate>20140123</enddate><creator>COON DEREK</creator><creator>HAZELTON ANDREW J</creator><scope>EVB</scope></search><sort><creationdate>20140123</creationdate><title>IMMERSION LITHOGRAPHY FLUID CONTROL SYSTEM</title><author>COON DEREK ; HAZELTON ANDREW J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2014013939A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2014</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>COON DEREK</creatorcontrib><creatorcontrib>HAZELTON ANDREW J</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>COON DEREK</au><au>HAZELTON ANDREW J</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>IMMERSION LITHOGRAPHY FLUID CONTROL SYSTEM</title><date>2014-01-23</date><risdate>2014</risdate><abstract>PROBLEM TO BE SOLVED: To provide a fluid control device capable of preventing fluid from moving away from an intentionally limited region in an immersion lithography apparatus, and preventing the fluid from entering a specific peripheral region outside an exposure region.SOLUTION: In an immersion lithography fluid control system, high pressure gas is used for a fluid control device 25 that holds immersion fluid in an exposure region 40 and a region in the vicinity of the same in a gap between an optical element 4, such as a lens, and a work piece (W) arranged in opposition to an optical member.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JP2014013939A |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | IMMERSION LITHOGRAPHY FLUID CONTROL SYSTEM |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-31T22%3A59%3A51IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=COON%20DEREK&rft.date=2014-01-23&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2014013939A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |