WAFER PROTECTIVE MEMBER
PROBLEM TO BE SOLVED: To provide a wafer protective member which allows for excellent wafer thinning and does not damage and contaminate a device on a surface side of a wafer even if a bump or the like is not formed but a surface of the device is formed flat in the wafer.SOLUTION: A wafer protective...
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creator | SAKAI MAKI |
description | PROBLEM TO BE SOLVED: To provide a wafer protective member which allows for excellent wafer thinning and does not damage and contaminate a device on a surface side of a wafer even if a bump or the like is not formed but a surface of the device is formed flat in the wafer.SOLUTION: A wafer protective member 1 protects a surface WS of a wafer W in which a device is formed. The wafer protective member 1 comprises: an outer periphery sticking part 3 stuck only to a chamfer part M of the wafer W and an outer periphery region GR in which a device is not formed; and a device protection part 4 which is surrounded by the outer periphery sticking part 3, abuts on a device region DR, and protects the device in a non-sticking state, and the like. A surface 6 abutting on the wafer W of the outer periphery sticking part 3 is formed of an inner peripheral surface 6a matching a cross-sectional shape of the chamber part M and a ring shape 6b corresponding to the outer periphery region GR. |
format | Patent |
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The wafer protective member 1 comprises: an outer periphery sticking part 3 stuck only to a chamfer part M of the wafer W and an outer periphery region GR in which a device is not formed; and a device protection part 4 which is surrounded by the outer periphery sticking part 3, abuts on a device region DR, and protects the device in a non-sticking state, and the like. A surface 6 abutting on the wafer W of the outer periphery sticking part 3 is formed of an inner peripheral surface 6a matching a cross-sectional shape of the chamber part M and a ring shape 6b corresponding to the outer periphery region GR.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20131205&DB=EPODOC&CC=JP&NR=2013243223A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20131205&DB=EPODOC&CC=JP&NR=2013243223A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SAKAI MAKI</creatorcontrib><title>WAFER PROTECTIVE MEMBER</title><description>PROBLEM TO BE SOLVED: To provide a wafer protective member which allows for excellent wafer thinning and does not damage and contaminate a device on a surface side of a wafer even if a bump or the like is not formed but a surface of the device is formed flat in the wafer.SOLUTION: A wafer protective member 1 protects a surface WS of a wafer W in which a device is formed. The wafer protective member 1 comprises: an outer periphery sticking part 3 stuck only to a chamfer part M of the wafer W and an outer periphery region GR in which a device is not formed; and a device protection part 4 which is surrounded by the outer periphery sticking part 3, abuts on a device region DR, and protects the device in a non-sticking state, and the like. A surface 6 abutting on the wafer W of the outer periphery sticking part 3 is formed of an inner peripheral surface 6a matching a cross-sectional shape of the chamber part M and a ring shape 6b corresponding to the outer periphery region GR.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBAPd3RzDVIICPIPcXUO8QxzVfB19XVyDeJhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGhsZGJsZGRsaOxkQpAgAS4R_Q</recordid><startdate>20131205</startdate><enddate>20131205</enddate><creator>SAKAI MAKI</creator><scope>EVB</scope></search><sort><creationdate>20131205</creationdate><title>WAFER PROTECTIVE MEMBER</title><author>SAKAI MAKI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2013243223A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>SAKAI MAKI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SAKAI MAKI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>WAFER PROTECTIVE MEMBER</title><date>2013-12-05</date><risdate>2013</risdate><abstract>PROBLEM TO BE SOLVED: To provide a wafer protective member which allows for excellent wafer thinning and does not damage and contaminate a device on a surface side of a wafer even if a bump or the like is not formed but a surface of the device is formed flat in the wafer.SOLUTION: A wafer protective member 1 protects a surface WS of a wafer W in which a device is formed. The wafer protective member 1 comprises: an outer periphery sticking part 3 stuck only to a chamfer part M of the wafer W and an outer periphery region GR in which a device is not formed; and a device protection part 4 which is surrounded by the outer periphery sticking part 3, abuts on a device region DR, and protects the device in a non-sticking state, and the like. A surface 6 abutting on the wafer W of the outer periphery sticking part 3 is formed of an inner peripheral surface 6a matching a cross-sectional shape of the chamber part M and a ring shape 6b corresponding to the outer periphery region GR.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
title | WAFER PROTECTIVE MEMBER |
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