PLASMA REACTOR EQUIPPED WITH DYNAMICALLY ADJUSTABLE PLASMA SOURCE OUTPUT APPLYING DEVICE

PROBLEM TO BE SOLVED: To provide a plasma reactor having improved uniformity.SOLUTION: The plasma reactor includes a process chamber 100, a workpiece support base 120, a process gas injection device 135, a vacuum pump 145, a plasma source output applying device 160 composed of an inside coil 162 and...

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Hauptverfasser: IBRAHIM M IBRAHIM, DARIN BIVENS, SHEEBA J PANAYIL, RICHARD LEWINGTON, RENEE KOCH, AJAY KUMAR, MICHAEL N GRIMBERGEN, MADHAVI R CHANDRACHOOD
Format: Patent
Sprache:eng
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