PLASMA REACTOR EQUIPPED WITH DYNAMICALLY ADJUSTABLE PLASMA SOURCE OUTPUT APPLYING DEVICE
PROBLEM TO BE SOLVED: To provide a plasma reactor having improved uniformity.SOLUTION: The plasma reactor includes a process chamber 100, a workpiece support base 120, a process gas injection device 135, a vacuum pump 145, a plasma source output applying device 160 composed of an inside coil 162 and...
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Format: | Patent |
Sprache: | eng |
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