OPTICAL ASSEMBLY FOR EUV LITHOGRAPHY
PROBLEM TO BE SOLVED: To provide an optical assembly capable of performing a measuring process for measuring illumination parameters or image formation parameters of EUV projection exposure equipment.SOLUTION: An optical assembly includes: an output coupling mirror emitting and coupling EUV light 3...
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| creator | RALF SCHARNWEBER |
| description | PROBLEM TO BE SOLVED: To provide an optical assembly capable of performing a measuring process for measuring illumination parameters or image formation parameters of EUV projection exposure equipment.SOLUTION: An optical assembly includes: an output coupling mirror emitting and coupling EUV light 3 from an illumination beam path; a diffusing mirror 23 provided in a beam path of a diffusing assembly 21 in a downstream of the output coupling mirror; and an input coupling mirror provided in a beam path of the diffusing assembly 21 in a downstream of the diffusing mirror 23 for coupling the EUV light diffused and reflected on to the illumination beam path. Accordingly, the optical assembly can be used for illuminating an object in an illumination angle distribution varying according to a diffusion function of the diffusing mirror. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2013239709A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2013239709A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2013239709A3</originalsourceid><addsrcrecordid>eNrjZFDxDwjxdHb0UXAMDnb1dfKJVHDzD1JwDQ1T8PEM8fB3D3IM8IjkYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBobGRsaW5gaWjsZEKQIAzQQjlQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>OPTICAL ASSEMBLY FOR EUV LITHOGRAPHY</title><source>esp@cenet</source><creator>RALF SCHARNWEBER</creator><creatorcontrib>RALF SCHARNWEBER</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide an optical assembly capable of performing a measuring process for measuring illumination parameters or image formation parameters of EUV projection exposure equipment.SOLUTION: An optical assembly includes: an output coupling mirror emitting and coupling EUV light 3 from an illumination beam path; a diffusing mirror 23 provided in a beam path of a diffusing assembly 21 in a downstream of the output coupling mirror; and an input coupling mirror provided in a beam path of the diffusing assembly 21 in a downstream of the diffusing mirror 23 for coupling the EUV light diffused and reflected on to the illumination beam path. Accordingly, the optical assembly can be used for illuminating an object in an illumination angle distribution varying according to a diffusion function of the diffusing mirror.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20131128&DB=EPODOC&CC=JP&NR=2013239709A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20131128&DB=EPODOC&CC=JP&NR=2013239709A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RALF SCHARNWEBER</creatorcontrib><title>OPTICAL ASSEMBLY FOR EUV LITHOGRAPHY</title><description>PROBLEM TO BE SOLVED: To provide an optical assembly capable of performing a measuring process for measuring illumination parameters or image formation parameters of EUV projection exposure equipment.SOLUTION: An optical assembly includes: an output coupling mirror emitting and coupling EUV light 3 from an illumination beam path; a diffusing mirror 23 provided in a beam path of a diffusing assembly 21 in a downstream of the output coupling mirror; and an input coupling mirror provided in a beam path of the diffusing assembly 21 in a downstream of the diffusing mirror 23 for coupling the EUV light diffused and reflected on to the illumination beam path. Accordingly, the optical assembly can be used for illuminating an object in an illumination angle distribution varying according to a diffusion function of the diffusing mirror.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFDxDwjxdHb0UXAMDnb1dfKJVHDzD1JwDQ1T8PEM8fB3D3IM8IjkYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBobGRsaW5gaWjsZEKQIAzQQjlQ</recordid><startdate>20131128</startdate><enddate>20131128</enddate><creator>RALF SCHARNWEBER</creator><scope>EVB</scope></search><sort><creationdate>20131128</creationdate><title>OPTICAL ASSEMBLY FOR EUV LITHOGRAPHY</title><author>RALF SCHARNWEBER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2013239709A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>RALF SCHARNWEBER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RALF SCHARNWEBER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>OPTICAL ASSEMBLY FOR EUV LITHOGRAPHY</title><date>2013-11-28</date><risdate>2013</risdate><abstract>PROBLEM TO BE SOLVED: To provide an optical assembly capable of performing a measuring process for measuring illumination parameters or image formation parameters of EUV projection exposure equipment.SOLUTION: An optical assembly includes: an output coupling mirror emitting and coupling EUV light 3 from an illumination beam path; a diffusing mirror 23 provided in a beam path of a diffusing assembly 21 in a downstream of the output coupling mirror; and an input coupling mirror provided in a beam path of the diffusing assembly 21 in a downstream of the diffusing mirror 23 for coupling the EUV light diffused and reflected on to the illumination beam path. Accordingly, the optical assembly can be used for illuminating an object in an illumination angle distribution varying according to a diffusion function of the diffusing mirror.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | OPTICAL ASSEMBLY FOR EUV LITHOGRAPHY |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T06%3A06%3A36IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=RALF%20SCHARNWEBER&rft.date=2013-11-28&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2013239709A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |