SUBSTRATE HOLDING DEVICE AND REPRODUCING METHOD THEREOF

PROBLEM TO BE SOLVED: To provide a substrate holding device capable of effectively removing carbons with a simple constitution, and a method for reproducing the substrate holding device.SOLUTION: A substrate holding device M according to the present device for holding a substrate to be processed in...

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Bibliographische Detailangaben
Hauptverfasser: SOGABE KOJI, TAKIZAWA KOICHI, ISHIDA MASAHIKO, FUKUMOTO HIDENORI, MORIMOTO NAOKI
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a substrate holding device capable of effectively removing carbons with a simple constitution, and a method for reproducing the substrate holding device.SOLUTION: A substrate holding device M according to the present device for holding a substrate to be processed in a vacuum chamber VC comprises chuck bodies 1, 2 having electrodes 3a, 3b. A rib section 2a that can be in face contact with an outer peripheral edge of the substrate, and a support section 2c provided in an internal space 2b surrounded by the rib section and supporting the substrate are provided on substrate suction faces of the chuck bodies. Gas introduction means 41, 7 for introducing oxygen-containing gas are connected to the internal space, and heating means 11 for heating the chuck bodies are further provided.