RESISTANCE SUBSTRATE AND MANUFACTURING METHOD THEREFOR

RESISTANCE SUBSTRATE AND MANUFACTURING METHOD THEREFOR

PROBLEM TO BE SOLVED: To provide a resistance substrate having excellent micro linearity characteristics, and to provide a manufacturing method therefor.SOLUTION: On an insulation substrate 11, a resistor pattern 12 on which a slider BR slides and a collector pattern 13 are provided with a space bet...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: KADOKAWA OSAMU
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRICITY
RESISTORS
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator KADOKAWA OSAMU
description PROBLEM TO BE SOLVED: To provide a resistance substrate having excellent micro linearity characteristics, and to provide a manufacturing method therefor.SOLUTION: On an insulation substrate 11, a resistor pattern 12 on which a slider BR slides and a collector pattern 13 are provided with a space between one other, and a pair of conductive electrode patterns 14 are formed, respectively, at both ends of the resistor pattern 12. In such a resistance substrate 1, the resistance substrate 1 includes an insulation pattern 15 provided on the insulation substrate 11 so as to connect the pair of conductive electrode patterns 14. Both ends of the insulation pattern 15 are superimposed on the pair of conductive electrode patterns 14, and the resistor pattern 12 is laminated on the insulation pattern 15 and the exposed parts 14a of the pair of conductive electrode patterns 14 exposed from the insulation pattern 15.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2013161890A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2013161890A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2013161890A3</originalsourceid><addsrcrecordid>eNrjZDALcg32DA5x9HN2VQgOdQoOCXIMcVVw9HNR8HX0C3VzdA4JDfL0c1fwdQ3x8HdRCPFwDXJ18w_iYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBobGhmaGFpYGjsZEKQIAhmIopA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>RESISTANCE SUBSTRATE AND MANUFACTURING METHOD THEREFOR</title><source>esp@cenet</source><creator>KADOKAWA OSAMU</creator><creatorcontrib>KADOKAWA OSAMU</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a resistance substrate having excellent micro linearity characteristics, and to provide a manufacturing method therefor.SOLUTION: On an insulation substrate 11, a resistor pattern 12 on which a slider BR slides and a collector pattern 13 are provided with a space between one other, and a pair of conductive electrode patterns 14 are formed, respectively, at both ends of the resistor pattern 12. In such a resistance substrate 1, the resistance substrate 1 includes an insulation pattern 15 provided on the insulation substrate 11 so as to connect the pair of conductive electrode patterns 14. Both ends of the insulation pattern 15 are superimposed on the pair of conductive electrode patterns 14, and the resistor pattern 12 is laminated on the insulation pattern 15 and the exposed parts 14a of the pair of conductive electrode patterns 14 exposed from the insulation pattern 15.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRICITY ; RESISTORS</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20130819&amp;DB=EPODOC&amp;CC=JP&amp;NR=2013161890A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20130819&amp;DB=EPODOC&amp;CC=JP&amp;NR=2013161890A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KADOKAWA OSAMU</creatorcontrib><title>RESISTANCE SUBSTRATE AND MANUFACTURING METHOD THEREFOR</title><description>PROBLEM TO BE SOLVED: To provide a resistance substrate having excellent micro linearity characteristics, and to provide a manufacturing method therefor.SOLUTION: On an insulation substrate 11, a resistor pattern 12 on which a slider BR slides and a collector pattern 13 are provided with a space between one other, and a pair of conductive electrode patterns 14 are formed, respectively, at both ends of the resistor pattern 12. In such a resistance substrate 1, the resistance substrate 1 includes an insulation pattern 15 provided on the insulation substrate 11 so as to connect the pair of conductive electrode patterns 14. Both ends of the insulation pattern 15 are superimposed on the pair of conductive electrode patterns 14, and the resistor pattern 12 is laminated on the insulation pattern 15 and the exposed parts 14a of the pair of conductive electrode patterns 14 exposed from the insulation pattern 15.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRICITY</subject><subject>RESISTORS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDALcg32DA5x9HN2VQgOdQoOCXIMcVVw9HNR8HX0C3VzdA4JDfL0c1fwdQ3x8HdRCPFwDXJ18w_iYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBobGhmaGFpYGjsZEKQIAhmIopA</recordid><startdate>20130819</startdate><enddate>20130819</enddate><creator>KADOKAWA OSAMU</creator><scope>EVB</scope></search><sort><creationdate>20130819</creationdate><title>RESISTANCE SUBSTRATE AND MANUFACTURING METHOD THEREFOR</title><author>KADOKAWA OSAMU</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2013161890A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRICITY</topic><topic>RESISTORS</topic><toplevel>online_resources</toplevel><creatorcontrib>KADOKAWA OSAMU</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KADOKAWA OSAMU</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>RESISTANCE SUBSTRATE AND MANUFACTURING METHOD THEREFOR</title><date>2013-08-19</date><risdate>2013</risdate><abstract>PROBLEM TO BE SOLVED: To provide a resistance substrate having excellent micro linearity characteristics, and to provide a manufacturing method therefor.SOLUTION: On an insulation substrate 11, a resistor pattern 12 on which a slider BR slides and a collector pattern 13 are provided with a space between one other, and a pair of conductive electrode patterns 14 are formed, respectively, at both ends of the resistor pattern 12. In such a resistance substrate 1, the resistance substrate 1 includes an insulation pattern 15 provided on the insulation substrate 11 so as to connect the pair of conductive electrode patterns 14. Both ends of the insulation pattern 15 are superimposed on the pair of conductive electrode patterns 14, and the resistor pattern 12 is laminated on the insulation pattern 15 and the exposed parts 14a of the pair of conductive electrode patterns 14 exposed from the insulation pattern 15.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_JP2013161890A
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
ELECTRICITY
RESISTORS
title RESISTANCE SUBSTRATE AND MANUFACTURING METHOD THEREFOR
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-29T06%3A36%3A35IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KADOKAWA%20OSAMU&rft.date=2013-08-19&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2013161890A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true