WAVEFRONT ABERRATION MEASURING APPARATUS AND METHOD FOR MANUFACTURING LENS

WAVEFRONT ABERRATION MEASURING APPARATUS AND METHOD FOR MANUFACTURING LENS

PROBLEM TO BE SOLVED: To provide a wavefront aberration measuring apparatus capable of performing accurate wavefront aberration measurement.SOLUTION: A wavefront aberration measuring apparatus 1 includes: a relay optical system 31 for receiving light passed through a test lens 10 and converting the...

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1. Verfasser: OTAKI TATSURO
Format: Patent
Sprache:eng
Schlagworte:
MEASURING
PHYSICS
TESTING
TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES
TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
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creator OTAKI TATSURO
description PROBLEM TO BE SOLVED: To provide a wavefront aberration measuring apparatus capable of performing accurate wavefront aberration measurement.SOLUTION: A wavefront aberration measuring apparatus 1 includes: a relay optical system 31 for receiving light passed through a test lens 10 and converting the received light into parallel light; a wavefront sensor 41 for dividing and detecting the parallel light from the relay optical system 31; an analyzer 52 for finding out a wavefront aberration of the test lens 10 on the basis of a detection signal of the light divided and detected by the wavefront sensor 41; and a driving device 46 for moving the wavefront sensor 41 along an optical axis so that a microlens array 42 of the wavefront sensor 41 is located on a position conjugate with an exit pupil 11 of the test lens 10.
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subjects MEASURING
PHYSICS
TESTING
TESTING STATIC OR DYNAMIC BALANCE OF MACHINES ORSTRUCTURES
TESTING STRUCTURES OR APPARATUS NOT OTHERWISE PROVIDED FOR
title WAVEFRONT ABERRATION MEASURING APPARATUS AND METHOD FOR MANUFACTURING LENS
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