PROJECTION OPTICAL SYSTEM OF CATADIOPTRIC AND PROJECTION EXPOSURE DEVICE EQUIPPED WITH THE SAME

PROBLEM TO BE SOLVED: To form a highly accurate pattern while ensuring a wide exposure area in a projection exposure device.SOLUTION: The projection optical system 30 of the projection exposure device comprises a first lens group 32, a second lens group 34, a third lens group 36, and a fourth lens g...

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Hauptverfasser:	HAMAWAKI TOMOHIRO, RI TOKU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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