ULTRA VIOLET RADIATION APPARATUS AND SUBSTRATE PROCESSING APPARATUS

ULTRA VIOLET RADIATION APPARATUS AND SUBSTRATE PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide an ultra violet radiation apparatus and a substrate processing apparatus which achieve the downsizing and the cost reduction.SOLUTION: An ultra violet radiation apparatus includes: a processing chamber where ultra violet radiation is performed to a substrate; a heati...

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Bibliographische Detailangaben
1. Verfasser: SHIMAI FUTOSHI
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS
CHEMISTRY
CONVEYING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GLASS
HANDLING THIN OR FILAMENTARY MATERIAL
JOINING GLASS TO GLASS OR OTHER MATERIALS
METALLURGY
MINERAL OR SLAG WOOL
PACKING
PERFORMING OPERATIONS
PNEUMATIC TUBE CONVEYORS
SEMICONDUCTOR DEVICES
SHOP CONVEYOR SYSTEMS
STORING
SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS
SURFACE TREATMENT OF GLASS
TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING
TRANSPORTING
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Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide an ultra violet radiation apparatus and a substrate processing apparatus which achieve the downsizing and the cost reduction.SOLUTION: An ultra violet radiation apparatus includes: a processing chamber where ultra violet radiation is performed to a substrate; a heating mechanism heating the substrate in at least the processing chamber; a gas supply part supplying a gas to the processing chamber so that the interior of the processing chamber is maintained in the deoxidation and dehydration states; and a spare chamber which is provided at least between a substrate transport port for carrying the substrate into the ultra violet radiation apparatus and the processing chamber and communicates with the processing chamber thereby maintaining a specified atmosphere in the processing chamber.