ETCHING APPARATUS, ETCHING METHOD, AND METHOD FOR MANUFACTURING SOLAR CELL

ETCHING APPARATUS, ETCHING METHOD, AND METHOD FOR MANUFACTURING SOLAR CELL

PROBLEM TO BE SOLVED: To obtain an etching apparatus which is capable of suppressing a texture formation failure as compared with conventional ones in a texture etching process in solar cell manufacturing.SOLUTION: The etching apparatus for etching a silicon substrate 100 by immersing it in an etcha...

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Hauptverfasser: YASUNAGA NOZOMI, KARAKIDA SHOICHI, NONOGAKI MITSUHIRO, KOBAYASHI JUNJI, OSHIRO YUSUKE, TSUGENO HAJIME, MURAKAMI TOSHIYA, YOSHIDA YASUHIRO
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Zusammenfassung:PROBLEM TO BE SOLVED: To obtain an etching apparatus which is capable of suppressing a texture formation failure as compared with conventional ones in a texture etching process in solar cell manufacturing.SOLUTION: The etching apparatus for etching a silicon substrate 100 by immersing it in an etchant 13 includes: an etching bath 11 in which the etchant 13 is stored and the silicon substrate 100 is etched; and a hydrophobic organic substance collection part 15 for collecting a hydrophobic organic substance eluted into the etchant 13.