CLEANING DEVICE, MEASUREMENT METHOD, AND CALIBRATION METHOD

PROBLEM TO BE SOLVED: To provide a cleaning device capable of effectively and stably cleaning a substrate, and a calibration method of a dissolved gas concentration measurement instrument and a dissolved gas concentration measurement method, which are used for the cleaning device.SOLUTION: The calib...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: UCHIBE MASASHI, TANABE ETSUKO, MORI YOSHIHIRO, SHINBARA TERUO
Format: Patent
Sprache:eng
Schlagworte:
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