METHOD FOR PRODUCING ACRYLIC RESIN COMPOSITION
PROBLEM TO BE SOLVED: To provide a low YI acrylic resin with a reduced content of foreign matter, to provide a composition of the same, and to provide a method for producing the composition.SOLUTION: The method for producing the acrylic resin is characterized by mixing an additive in an extruder whi...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | NAKADA YOSHITOMO |
| description | PROBLEM TO BE SOLVED: To provide a low YI acrylic resin with a reduced content of foreign matter, to provide a composition of the same, and to provide a method for producing the composition.SOLUTION: The method for producing the acrylic resin is characterized by mixing an additive in an extruder which has been used for the polymerization of the monomer of the acrylic resin or the devolatization of the resin. Thus, the step for production of the acrylic resin can prevent the contact of the inside of the production apparatus with oxygen in the outside environment, and the thermal history to the acrylic resin is small. The present invention can provide an acrylic resin having 5 or less YI in 15 wt.% chloroform solution and containing 100 pieces or less of foreign matter having a particle size of 20 μm or more in one gram of the resin. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2013091803A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2013091803A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2013091803A3</originalsourceid><addsrcrecordid>eNrjZNDzdQ3x8HdRcPMPUggI8ncJdfb0c1dwdA6K9PF0VghyDfb0U3D29w3wD_YM8fT342FgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgaGxgaWhhYGxo7GRCkCADtAJk4</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD FOR PRODUCING ACRYLIC RESIN COMPOSITION</title><source>esp@cenet</source><creator>NAKADA YOSHITOMO</creator><creatorcontrib>NAKADA YOSHITOMO</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a low YI acrylic resin with a reduced content of foreign matter, to provide a composition of the same, and to provide a method for producing the composition.SOLUTION: The method for producing the acrylic resin is characterized by mixing an additive in an extruder which has been used for the polymerization of the monomer of the acrylic resin or the devolatization of the resin. Thus, the step for production of the acrylic resin can prevent the contact of the inside of the production apparatus with oxygen in the outside environment, and the thermal history to the acrylic resin is small. The present invention can provide an acrylic resin having 5 or less YI in 15 wt.% chloroform solution and containing 100 pieces or less of foreign matter having a particle size of 20 μm or more in one gram of the resin.</description><language>eng</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; GENERAL PROCESSES OF COMPOUNDING ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; WORKING-UP</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130516&DB=EPODOC&CC=JP&NR=2013091803A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130516&DB=EPODOC&CC=JP&NR=2013091803A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NAKADA YOSHITOMO</creatorcontrib><title>METHOD FOR PRODUCING ACRYLIC RESIN COMPOSITION</title><description>PROBLEM TO BE SOLVED: To provide a low YI acrylic resin with a reduced content of foreign matter, to provide a composition of the same, and to provide a method for producing the composition.SOLUTION: The method for producing the acrylic resin is characterized by mixing an additive in an extruder which has been used for the polymerization of the monomer of the acrylic resin or the devolatization of the resin. Thus, the step for production of the acrylic resin can prevent the contact of the inside of the production apparatus with oxygen in the outside environment, and the thermal history to the acrylic resin is small. The present invention can provide an acrylic resin having 5 or less YI in 15 wt.% chloroform solution and containing 100 pieces or less of foreign matter having a particle size of 20 μm or more in one gram of the resin.</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNDzdQ3x8HdRcPMPUggI8ncJdfb0c1dwdA6K9PF0VghyDfb0U3D29w3wD_YM8fT342FgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8V4BRgaGxgaWhhYGxo7GRCkCADtAJk4</recordid><startdate>20130516</startdate><enddate>20130516</enddate><creator>NAKADA YOSHITOMO</creator><scope>EVB</scope></search><sort><creationdate>20130516</creationdate><title>METHOD FOR PRODUCING ACRYLIC RESIN COMPOSITION</title><author>NAKADA YOSHITOMO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2013091803A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2013</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>NAKADA YOSHITOMO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NAKADA YOSHITOMO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR PRODUCING ACRYLIC RESIN COMPOSITION</title><date>2013-05-16</date><risdate>2013</risdate><abstract>PROBLEM TO BE SOLVED: To provide a low YI acrylic resin with a reduced content of foreign matter, to provide a composition of the same, and to provide a method for producing the composition.SOLUTION: The method for producing the acrylic resin is characterized by mixing an additive in an extruder which has been used for the polymerization of the monomer of the acrylic resin or the devolatization of the resin. Thus, the step for production of the acrylic resin can prevent the contact of the inside of the production apparatus with oxygen in the outside environment, and the thermal history to the acrylic resin is small. The present invention can provide an acrylic resin having 5 or less YI in 15 wt.% chloroform solution and containing 100 pieces or less of foreign matter having a particle size of 20 μm or more in one gram of the resin.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JP2013091803A |
| source | esp@cenet |
| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS GENERAL PROCESSES OF COMPOUNDING MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP |
| title | METHOD FOR PRODUCING ACRYLIC RESIN COMPOSITION |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-06T09%3A57%3A30IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=NAKADA%20YOSHITOMO&rft.date=2013-05-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2013091803A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |