METHOD FOR EVALUATING CHARGED PARTICLE BEAM LITHOGRAPHY DEVICE, AND CHARGED PARTICLE BEAM LITHOGRAPHY DEVICE

PROBLEM TO BE SOLVED: To provide a method for evaluating a charged particle beam lithography device and a charged particle beam lithography device, capable of calculating a settling condition with high accuracy by drawing a measurement pattern image more accurately by suppressing the occurrence of a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NISHIMURA RIEKO, NAKAHASHI REI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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