FLATNESS MEASURING DEVICE

PROBLEM TO BE SOLVED: To improve measurement accuracy and a region resolution in a flatness measuring device using a Shack Hartmann wavefront sensor.SOLUTION: A flatness measuring device comprises a light source 1 which emits primary light flux B1 that is light flux which can be made parallel, light...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HAMADA MOTOAKI, SATO SEICHI
Format: Patent
Sprache:eng
Schlagworte:
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