RESIST ANTISTATIC FILM LAMINATE, METHOD FOR PRODUCING RELIEF PATTERN, AND ELECTRONIC COMPONENT

PROBLEM TO BE SOLVED: To provide a resist antistatic film laminate, which avoids a charge-up phenomenon, suppresses changes in the sensitivity after electron beam drawing, allows pattern formation in dimensions as designed, and gives a fine relief pattern with high sensitivity, high resolution and l...

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Bibliographische Detailangaben
Hauptverfasser:	KANKE SATORU, OKUYAMA KENICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a resist antistatic film laminate, which avoids a charge-up phenomenon, suppresses changes in the sensitivity after electron beam drawing, allows pattern formation in dimensions as designed, and gives a fine relief pattern with high sensitivity, high resolution and low line edge roughness, while the laminate has alkali developability.SOLUTION: The resist antistatic film laminate includes at least (I) a resist film comprising the following negative resist composition and (II) an antistatic film on a support body. The negative resist composition comprises: a phenolic compound (A) having two or more phenolic hydroxyl groups in one molecule, having at least one kind of substituent selected from a hydroxymethyl group and an alkoxymethyl group at an ortho-position of the phenolic hydroxyl group, and having a molecular weight of 400 to 2500; and an acid generator (B) that generates sulfonic acid having no fluorine atom bonded thereto by irradiation with electron beams. The content of the phenolic compound (A) is 70 wt.% or more in the whole solid content of the negative resist composition.