VAPOR DEPOSITION METHOD OF METAL OXIDE FILM, AND METHOD FOR MANUFACTURING PLASMA DISPLAY PANEL

PROBLEM TO BE SOLVED: To provide a method for forming a metal oxide film by vapor-depositing a metal oxide that is an evaporation material, particularly for forming a protective film for a plasma display panel (hereafter referred to as PDP), which improves the productivity and panel characteristics...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YANO TAKANOBU, IIJIMA EIICHI, HAKOMORI MUNEHITO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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