VAPOR DEPOSITION METHOD OF METAL OXIDE FILM, AND METHOD FOR MANUFACTURING PLASMA DISPLAY PANEL
PROBLEM TO BE SOLVED: To provide a method for forming a metal oxide film by vapor-depositing a metal oxide that is an evaporation material, particularly for forming a protective film for a plasma display panel (hereafter referred to as PDP), which improves the productivity and panel characteristics...
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| creator | YANO TAKANOBU IIJIMA EIICHI HAKOMORI MUNEHITO |
| description | PROBLEM TO BE SOLVED: To provide a method for forming a metal oxide film by vapor-depositing a metal oxide that is an evaporation material, particularly for forming a protective film for a plasma display panel (hereafter referred to as PDP), which improves the productivity and panel characteristics by increasing a film-forming rate of an MgO film oriented in direction as the protective film.SOLUTION: The method for forming a metal oxide film by vapor-depositing a metal oxide, that is an evaporation material, includes: employing an electron gun as a means for heating the evaporation material; narrowing the electron beam emitted from the electron gun; and controlling the oscillation waveform of the electron beam, based on the diameter of the electron beam and according to the surface area irradiated with the electron beam to the evaporation material. This method increases the film-forming rate of the MgO film which is the protective film for the plasma display, which includes a front substrate comprising a scanning electrode, a sustaining electrode, a dielectric layer and the protective film, and a back substrate comprising an address electrode, a barrier rib, and a fluorescent body, and also provides the adequate panel characteristics. |
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This method increases the film-forming rate of the MgO film which is the protective film for the plasma display, which includes a front substrate comprising a scanning electrode, a sustaining electrode, a dielectric layer and the protective film, and a back substrate comprising an address electrode, a barrier rib, and a fluorescent body, and also provides the adequate panel characteristics.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20121025&DB=EPODOC&CC=JP&NR=2012207310A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,777,882,25545,76296</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20121025&DB=EPODOC&CC=JP&NR=2012207310A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YANO TAKANOBU</creatorcontrib><creatorcontrib>IIJIMA EIICHI</creatorcontrib><creatorcontrib>HAKOMORI MUNEHITO</creatorcontrib><title>VAPOR DEPOSITION METHOD OF METAL OXIDE FILM, AND METHOD FOR MANUFACTURING PLASMA DISPLAY PANEL</title><description>PROBLEM TO BE SOLVED: To provide a method for forming a metal oxide film by vapor-depositing a metal oxide that is an evaporation material, particularly for forming a protective film for a plasma display panel (hereafter referred to as PDP), which improves the productivity and panel characteristics by increasing a film-forming rate of an MgO film oriented in direction as the protective film.SOLUTION: The method for forming a metal oxide film by vapor-depositing a metal oxide, that is an evaporation material, includes: employing an electron gun as a means for heating the evaporation material; narrowing the electron beam emitted from the electron gun; and controlling the oscillation waveform of the electron beam, based on the diameter of the electron beam and according to the surface area irradiated with the electron beam to the evaporation material. This method increases the film-forming rate of the MgO film which is the protective film for the plasma display, which includes a front substrate comprising a scanning electrode, a sustaining electrode, a dielectric layer and the protective film, and a back substrate comprising an address electrode, a barrier rib, and a fluorescent body, and also provides the adequate panel characteristics.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi7EKwjAURbM4iPoPD2eFNB2cH01iI0leaFLRxVIkTqKF-v9YQXenc-DcO2eXIwZqQKpA0SRDHpxKNUkg_TG0QCcjFWhj3QbQy1_X08uhbzVWqW2M30OwGB2CNHGyMwT0yi7Z7Nbfx7z6csHWWqWq3ubh2eVx6K_5kV_dIQheCMF3ZcGx_Gv0BlY3Muw</recordid><startdate>20121025</startdate><enddate>20121025</enddate><creator>YANO TAKANOBU</creator><creator>IIJIMA EIICHI</creator><creator>HAKOMORI MUNEHITO</creator><scope>EVB</scope></search><sort><creationdate>20121025</creationdate><title>VAPOR DEPOSITION METHOD OF METAL OXIDE FILM, AND METHOD FOR MANUFACTURING PLASMA DISPLAY PANEL</title><author>YANO TAKANOBU ; IIJIMA EIICHI ; HAKOMORI MUNEHITO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2012207310A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>YANO TAKANOBU</creatorcontrib><creatorcontrib>IIJIMA EIICHI</creatorcontrib><creatorcontrib>HAKOMORI MUNEHITO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YANO TAKANOBU</au><au>IIJIMA EIICHI</au><au>HAKOMORI MUNEHITO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>VAPOR DEPOSITION METHOD OF METAL OXIDE FILM, AND METHOD FOR MANUFACTURING PLASMA DISPLAY PANEL</title><date>2012-10-25</date><risdate>2012</risdate><abstract>PROBLEM TO BE SOLVED: To provide a method for forming a metal oxide film by vapor-depositing a metal oxide that is an evaporation material, particularly for forming a protective film for a plasma display panel (hereafter referred to as PDP), which improves the productivity and panel characteristics by increasing a film-forming rate of an MgO film oriented in direction as the protective film.SOLUTION: The method for forming a metal oxide film by vapor-depositing a metal oxide, that is an evaporation material, includes: employing an electron gun as a means for heating the evaporation material; narrowing the electron beam emitted from the electron gun; and controlling the oscillation waveform of the electron beam, based on the diameter of the electron beam and according to the surface area irradiated with the electron beam to the evaporation material. This method increases the film-forming rate of the MgO film which is the protective film for the plasma display, which includes a front substrate comprising a scanning electrode, a sustaining electrode, a dielectric layer and the protective film, and a back substrate comprising an address electrode, a barrier rib, and a fluorescent body, and also provides the adequate panel characteristics.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | VAPOR DEPOSITION METHOD OF METAL OXIDE FILM, AND METHOD FOR MANUFACTURING PLASMA DISPLAY PANEL |
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