VAPOR DEPOSITION METHOD OF METAL OXIDE FILM, AND METHOD FOR MANUFACTURING PLASMA DISPLAY PANEL

PROBLEM TO BE SOLVED: To provide a method for forming a metal oxide film by vapor-depositing a metal oxide that is an evaporation material, particularly for forming a protective film for a plasma display panel (hereafter referred to as PDP), which improves the productivity and panel characteristics by increasing a film-forming rate of an MgO film oriented in direction as the protective film.SOLUTION: The method for forming a metal oxide film by vapor-depositing a metal oxide, that is an evaporation material, includes: employing an electron gun as a means for heating the evaporation material; narrowing the electron beam emitted from the electron gun; and controlling the oscillation waveform of the electron beam, based on the diameter of the electron beam and according to the surface area irradiated with the electron beam to the evaporation material. This method increases the film-forming rate of the MgO film which is the protective film for the plasma display, which includes a front substrate comprising a scanning electrode, a sustaining electrode, a dielectric layer and the protective film, and a back substrate comprising an address electrode, a barrier rib, and a fluorescent body, and also provides the adequate panel characteristics.