CLUSTER TOOL ARCHITECTURE FOR PROCESSING SUBSTRATE
PROBLEM TO BE SOLVED: To provide an apparatus and method for processing substrates using a multi-chamber processing system (for example, a cluster tool) that has an increased throughput and an increased reliability.SOLUTION: A substrate that is processed in a cluster tool 10 has a high repeatability...
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| creator | JOHN A BAKER HARALD HERCHEN CHARLES CARLSON JEFFREY HUDGENS ISHIKAWA TETSUYA RICK J ROBERTS MICHAEL RICE WANG CHONGYANG BRYAN LEW LEON VOLFOVSKI ROBERT LAWRENCE HELEN R ARMER QUACH DAVID H JAY D PINSON SALEK MOHSEN S WILLIAM TAYLOR WEAVER |
| description | PROBLEM TO BE SOLVED: To provide an apparatus and method for processing substrates using a multi-chamber processing system (for example, a cluster tool) that has an increased throughput and an increased reliability.SOLUTION: A substrate that is processed in a cluster tool 10 has a high repeatability, with a smaller system footprint. In one embodiment of the cluster tool 10, the cost of ownership is reduced by grouping substrates together and transferring and processing the substrates in groups of two or more to improve system throughput. In order to reduce the cost of ownership, the number of moves a robot has to make to transfer a batch of substrates between the processing chambers is also decreased to reduce wear on the robot and increase system reliability. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2012169654A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2012169654A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2012169654A3</originalsourceid><addsrcrecordid>eNrjZDBy9gkNDnENUgjx9_dRcAxy9vAMcXUOCQ1yVXDzD1IICPJ3dg0O9vRzVwgOdQoOCXIMceVhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGhkaGZpZmpiaOxkQpAgD1zye5</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CLUSTER TOOL ARCHITECTURE FOR PROCESSING SUBSTRATE</title><source>esp@cenet</source><creator>JOHN A BAKER ; HARALD HERCHEN ; CHARLES CARLSON ; JEFFREY HUDGENS ; ISHIKAWA TETSUYA ; RICK J ROBERTS ; MICHAEL RICE ; WANG CHONGYANG ; BRYAN LEW ; LEON VOLFOVSKI ; ROBERT LAWRENCE ; HELEN R ARMER ; QUACH DAVID H ; JAY D PINSON ; SALEK MOHSEN S ; WILLIAM TAYLOR WEAVER</creator><creatorcontrib>JOHN A BAKER ; HARALD HERCHEN ; CHARLES CARLSON ; JEFFREY HUDGENS ; ISHIKAWA TETSUYA ; RICK J ROBERTS ; MICHAEL RICE ; WANG CHONGYANG ; BRYAN LEW ; LEON VOLFOVSKI ; ROBERT LAWRENCE ; HELEN R ARMER ; QUACH DAVID H ; JAY D PINSON ; SALEK MOHSEN S ; WILLIAM TAYLOR WEAVER</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide an apparatus and method for processing substrates using a multi-chamber processing system (for example, a cluster tool) that has an increased throughput and an increased reliability.SOLUTION: A substrate that is processed in a cluster tool 10 has a high repeatability, with a smaller system footprint. In one embodiment of the cluster tool 10, the cost of ownership is reduced by grouping substrates together and transferring and processing the substrates in groups of two or more to improve system throughput. In order to reduce the cost of ownership, the number of moves a robot has to make to transfer a batch of substrates between the processing chambers is also decreased to reduce wear on the robot and increase system reliability. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.</description><language>eng</language><subject>ACCESSORIES THEREFOR ; APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS ; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES ; APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM ; APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS ; CONTROL OR REGULATING SYSTEMS IN GENERAL ; CONTROLLING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS ; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC ; GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS ; HOLOGRAPHY ; MATERIALS THEREFOR ; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; REGULATING ; SEMICONDUCTOR DEVICES ; TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION ; TECHNICAL SUBJECTS COVERED BY FORMER USPC ; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS ; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS ; TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120906&DB=EPODOC&CC=JP&NR=2012169654A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120906&DB=EPODOC&CC=JP&NR=2012169654A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>JOHN A BAKER</creatorcontrib><creatorcontrib>HARALD HERCHEN</creatorcontrib><creatorcontrib>CHARLES CARLSON</creatorcontrib><creatorcontrib>JEFFREY HUDGENS</creatorcontrib><creatorcontrib>ISHIKAWA TETSUYA</creatorcontrib><creatorcontrib>RICK J ROBERTS</creatorcontrib><creatorcontrib>MICHAEL RICE</creatorcontrib><creatorcontrib>WANG CHONGYANG</creatorcontrib><creatorcontrib>BRYAN LEW</creatorcontrib><creatorcontrib>LEON VOLFOVSKI</creatorcontrib><creatorcontrib>ROBERT LAWRENCE</creatorcontrib><creatorcontrib>HELEN R ARMER</creatorcontrib><creatorcontrib>QUACH DAVID H</creatorcontrib><creatorcontrib>JAY D PINSON</creatorcontrib><creatorcontrib>SALEK MOHSEN S</creatorcontrib><creatorcontrib>WILLIAM TAYLOR WEAVER</creatorcontrib><title>CLUSTER TOOL ARCHITECTURE FOR PROCESSING SUBSTRATE</title><description>PROBLEM TO BE SOLVED: To provide an apparatus and method for processing substrates using a multi-chamber processing system (for example, a cluster tool) that has an increased throughput and an increased reliability.SOLUTION: A substrate that is processed in a cluster tool 10 has a high repeatability, with a smaller system footprint. 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In one embodiment of the cluster tool 10, the cost of ownership is reduced by grouping substrates together and transferring and processing the substrates in groups of two or more to improve system throughput. In order to reduce the cost of ownership, the number of moves a robot has to make to transfer a batch of substrates between the processing chambers is also decreased to reduce wear on the robot and increase system reliability. Embodiments also provide for a method and apparatus that are used to increase the reliability of the substrate transfer process to reduce system down time.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | ACCESSORIES THEREFOR APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION ORPROCESSING OF GOODS CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS HOLOGRAPHY MATERIALS THEREFOR MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REGULATING SEMICONDUCTOR DEVICES TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION TECHNICAL SUBJECTS COVERED BY FORMER USPC TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ARTCOLLECTIONS [XRACs] AND DIGESTS TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINSTCLIMATE CHANGE |
| title | CLUSTER TOOL ARCHITECTURE FOR PROCESSING SUBSTRATE |
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