SUBSTRATE LIQUID PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate liquid processing apparatus which can prevent a processing liquid scattered from a substrate from reattaching to the substrate.SOLUTION: A substrate liquid processing apparatus 10 of the present invention includes a guide rotary cup 21 guiding a processin...

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Bibliographische Detailangaben
Hauptverfasser:	OGATA NOBUHIRO, NAGAMINE SHUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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