SUBSTRATE LIQUID PROCESSING APPARATUS

SUBSTRATE LIQUID PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate liquid processing apparatus which can prevent a processing liquid scattered from a substrate from reattaching to the substrate.SOLUTION: A substrate liquid processing apparatus 10 of the present invention includes a guide rotary cup 21 guiding a processin...

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Hauptverfasser: OGATA NOBUHIRO, NAGAMINE SHUICHI
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator OGATA NOBUHIRO
NAGAMINE SHUICHI
description PROBLEM TO BE SOLVED: To provide a substrate liquid processing apparatus which can prevent a processing liquid scattered from a substrate from reattaching to the substrate.SOLUTION: A substrate liquid processing apparatus 10 of the present invention includes a guide rotary cup 21 guiding a processing liquid scattered from a substrate W held by a substrate holding base 12 and rotating, and a guide cup 31 guiding the processing liquid guided by the guide rotary cup 21 downward. The guide cup 31 includes: a downward extension part 33 extending downward from an inner peripheral end 32a of a guide cup body 32; and an inner peripheral side extension part 34 extending from the inner peripheral end 32a to the inner peripheral side than the downward extension part 33 to form a gas guide space 35 together with the guide rotary cup 21 and the downward extension part 33, for guiding downward a gas revolving by rotation of the guide rotary cup 21.
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title SUBSTRATE LIQUID PROCESSING APPARATUS
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