SUBSTRATE LIQUID PROCESSING APPARATUS

PROBLEM TO BE SOLVED: To provide a substrate liquid processing apparatus which can improve a collection rate of a processing liquid scattered from a substrate.SOLUTION: A substrate liquid processing apparatus comprises: a first guide cup 31 and a second guide cup 41 which guide processing liquids do...

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Bibliographische Detailangaben
Hauptverfasser:	OGATA NOBUHIRO, NAGAMINE SHUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a substrate liquid processing apparatus which can improve a collection rate of a processing liquid scattered from a substrate.SOLUTION: A substrate liquid processing apparatus comprises: a first guide cup 31 and a second guide cup 41 which guide processing liquids downward scattered from a substrate W held by a substrate holding base 12 and rotating; the substrate holding base 12; a position adjustment mechanism adjusting a positional relationship between the first guide cup 31 and the second guide cup 41; and a first processing liquid collection tank 61 and a second processing liquid collection tank 62 collecting processing liquids guided by the first guide cup 31 and the second guide cup 41, respectively. An exhaust member 71 is provided between the first processing liquid collection tank 61 and the second processing liquid collection tank 62. At a lower end 41b of the second guide cup 41, a guide member 81 is provided, which guides a processing liquid from the first guide cup 31 to the first processing liquid collection tank 61 and guides a processing liquid from the second guide cup 41 to the second processing liquid collection tank 62.