METHOD FOR PRODUCING HOLLOW SILICA NANOPARTICLE

METHOD FOR PRODUCING HOLLOW SILICA NANOPARTICLE

PROBLEM TO BE SOLVED: To provide a method for producing hollow silica nanoparticles having a primary grain size of 100 nm or less.SOLUTION: The method for producing hollow silica nanoparticles having a primary grain size of 100 nm or less includes following steps (1) and (2). (1): A water dispersion...

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Hauptverfasser: MARUNO YUJI, HOSOKAWA KOJI, SAKAI TAKANARI
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CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
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creator MARUNO YUJI
HOSOKAWA KOJI
SAKAI TAKANARI
description PROBLEM TO BE SOLVED: To provide a method for producing hollow silica nanoparticles having a primary grain size of 100 nm or less.SOLUTION: The method for producing hollow silica nanoparticles having a primary grain size of 100 nm or less includes following steps (1) and (2). (1): A water dispersion of an associated body of a two chain-type cationic surfactant (A) is prepared by subjecting an aqueous solution of the two chain-type cationic surfactant (A) to ultrasonic irradiation at a temperature of a Krafft point of the two chain-type cationic surfactant (A) or higher. (2): The water dispersion of the associated body of the two chain-type cationic surfactant (A) obtained in the step (1) and an alkoxysilane (B) are mixed with each other at the temperature of the Krafft point of the two chain-type cationic surfactant (A) or lower.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2012111641A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2012111641A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2012111641A3</originalsourceid><addsrcrecordid>eNrjZND3dQ3x8HdRcPMPUggI8ncJdfb0c1fw8Pfx8Q9XCPb08XR2VPBz9PMPcAwK8XT2ceVhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGhkaGhoZmJoaOxkQpAgBX7CZt</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>METHOD FOR PRODUCING HOLLOW SILICA NANOPARTICLE</title><source>esp@cenet</source><creator>MARUNO YUJI ; HOSOKAWA KOJI ; SAKAI TAKANARI</creator><creatorcontrib>MARUNO YUJI ; HOSOKAWA KOJI ; SAKAI TAKANARI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a method for producing hollow silica nanoparticles having a primary grain size of 100 nm or less.SOLUTION: The method for producing hollow silica nanoparticles having a primary grain size of 100 nm or less includes following steps (1) and (2). (1): A water dispersion of an associated body of a two chain-type cationic surfactant (A) is prepared by subjecting an aqueous solution of the two chain-type cationic surfactant (A) to ultrasonic irradiation at a temperature of a Krafft point of the two chain-type cationic surfactant (A) or higher. (2): The water dispersion of the associated body of the two chain-type cationic surfactant (A) obtained in the step (1) and an alkoxysilane (B) are mixed with each other at the temperature of the Krafft point of the two chain-type cationic surfactant (A) or lower.</description><language>eng</language><subject>CHEMISTRY ; COMPOUNDS THEREOF ; INORGANIC CHEMISTRY ; METALLURGY ; NON-METALLIC ELEMENTS</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20120614&amp;DB=EPODOC&amp;CC=JP&amp;NR=2012111641A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20120614&amp;DB=EPODOC&amp;CC=JP&amp;NR=2012111641A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MARUNO YUJI</creatorcontrib><creatorcontrib>HOSOKAWA KOJI</creatorcontrib><creatorcontrib>SAKAI TAKANARI</creatorcontrib><title>METHOD FOR PRODUCING HOLLOW SILICA NANOPARTICLE</title><description>PROBLEM TO BE SOLVED: To provide a method for producing hollow silica nanoparticles having a primary grain size of 100 nm or less.SOLUTION: The method for producing hollow silica nanoparticles having a primary grain size of 100 nm or less includes following steps (1) and (2). (1): A water dispersion of an associated body of a two chain-type cationic surfactant (A) is prepared by subjecting an aqueous solution of the two chain-type cationic surfactant (A) to ultrasonic irradiation at a temperature of a Krafft point of the two chain-type cationic surfactant (A) or higher. (2): The water dispersion of the associated body of the two chain-type cationic surfactant (A) obtained in the step (1) and an alkoxysilane (B) are mixed with each other at the temperature of the Krafft point of the two chain-type cationic surfactant (A) or lower.</description><subject>CHEMISTRY</subject><subject>COMPOUNDS THEREOF</subject><subject>INORGANIC CHEMISTRY</subject><subject>METALLURGY</subject><subject>NON-METALLIC ELEMENTS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZND3dQ3x8HdRcPMPUggI8ncJdfb0c1fw8Pfx8Q9XCPb08XR2VPBz9PMPcAwK8XT2ceVhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGhkaGhoZmJoaOxkQpAgBX7CZt</recordid><startdate>20120614</startdate><enddate>20120614</enddate><creator>MARUNO YUJI</creator><creator>HOSOKAWA KOJI</creator><creator>SAKAI TAKANARI</creator><scope>EVB</scope></search><sort><creationdate>20120614</creationdate><title>METHOD FOR PRODUCING HOLLOW SILICA NANOPARTICLE</title><author>MARUNO YUJI ; HOSOKAWA KOJI ; SAKAI TAKANARI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2012111641A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2012</creationdate><topic>CHEMISTRY</topic><topic>COMPOUNDS THEREOF</topic><topic>INORGANIC CHEMISTRY</topic><topic>METALLURGY</topic><topic>NON-METALLIC ELEMENTS</topic><toplevel>online_resources</toplevel><creatorcontrib>MARUNO YUJI</creatorcontrib><creatorcontrib>HOSOKAWA KOJI</creatorcontrib><creatorcontrib>SAKAI TAKANARI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MARUNO YUJI</au><au>HOSOKAWA KOJI</au><au>SAKAI TAKANARI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD FOR PRODUCING HOLLOW SILICA NANOPARTICLE</title><date>2012-06-14</date><risdate>2012</risdate><abstract>PROBLEM TO BE SOLVED: To provide a method for producing hollow silica nanoparticles having a primary grain size of 100 nm or less.SOLUTION: The method for producing hollow silica nanoparticles having a primary grain size of 100 nm or less includes following steps (1) and (2). (1): A water dispersion of an associated body of a two chain-type cationic surfactant (A) is prepared by subjecting an aqueous solution of the two chain-type cationic surfactant (A) to ultrasonic irradiation at a temperature of a Krafft point of the two chain-type cationic surfactant (A) or higher. (2): The water dispersion of the associated body of the two chain-type cationic surfactant (A) obtained in the step (1) and an alkoxysilane (B) are mixed with each other at the temperature of the Krafft point of the two chain-type cationic surfactant (A) or lower.</abstract><oa>free_for_read</oa></addata></record>
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subjects CHEMISTRY
COMPOUNDS THEREOF
INORGANIC CHEMISTRY
METALLURGY
NON-METALLIC ELEMENTS
title METHOD FOR PRODUCING HOLLOW SILICA NANOPARTICLE
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T19%3A43%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MARUNO%20YUJI&rft.date=2012-06-14&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2012111641A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true