ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS

PROBLEM TO BE SOLVED: To provide an ion implantation method realizing a predetermined implantation amount distribution on a glass substrate by at least partially superposing a plurality of ribbon-shaped ion beams, in which a beam current density distribution of each ribbon-shaped ion beam is efficie...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	NAITO KATSUO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
Online-Zugang:	Volltext bestellen
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