LAYOUT DESIGN FOR HIGH POWER, GALLIUM NITRIDE BASED FET

PROBLEM TO BE SOLVED: To provide an FET.SOLUTION: The FET includes a substrate, a buffer layer disposed on the substrate, a channel layer disposed over the buffer layer and a barrier layer disposed over the channel layer. Source, gate and drain electrodes are located over the barrier layer and exten...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: BORIS PERES, LINLIN LIU, MILAN POFFLEY STITCH
Format: Patent
Sprache:eng
Schlagworte:
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