FILM CONTAINING FLUORENE COPOLYMER
PROBLEM TO BE SOLVED: To provide a substance exhibiting hole transporting and electron transporting properties.SOLUTION: A film containing at least 0.1 wt.% of a copolymer containing at least 1% of a monomeric unit contains: (a) monomeric units at least 10% of which are fluorene moieties selected fr...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | WOO EDMUND P WU WEISHI INBASEKARAN MICHAEL BERNIUS MARK T |
description | PROBLEM TO BE SOLVED: To provide a substance exhibiting hole transporting and electron transporting properties.SOLUTION: A film containing at least 0.1 wt.% of a copolymer containing at least 1% of a monomeric unit contains: (a) monomeric units at least 10% of which are fluorene moieties selected from 9-substituted moieties and 9,9-disubstituted fluorene moieties, or combinations thereof; (b) and two other moieties each different but containing delocalized π-electrons. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2011252173A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2011252173A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2011252173A3</originalsourceid><addsrcrecordid>eNrjZFBy8_TxVXD29wtx9PTz9HNXcPMJ9Q9y9XMFigX4-0T6ugbxMLCmJeYUp_JCaW6gJtcQZw_d1IL8-NTigsTk1LzUknivACMDQ0MjUyNDc2NHY6IUAQCHyyL5</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>FILM CONTAINING FLUORENE COPOLYMER</title><source>esp@cenet</source><creator>WOO EDMUND P ; WU WEISHI ; INBASEKARAN MICHAEL ; BERNIUS MARK T</creator><creatorcontrib>WOO EDMUND P ; WU WEISHI ; INBASEKARAN MICHAEL ; BERNIUS MARK T</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a substance exhibiting hole transporting and electron transporting properties.SOLUTION: A film containing at least 0.1 wt.% of a copolymer containing at least 1% of a monomeric unit contains: (a) monomeric units at least 10% of which are fluorene moieties selected from 9-substituted moieties and 9,9-disubstituted fluorene moieties, or combinations thereof; (b) and two other moieties each different but containing delocalized π-electrons.</description><language>eng</language><subject>ADHESIVES ; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; DYES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; GENERAL PROCESSES OF COMPOUNDING ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC MACROMOLECULAR COMPOUNDS ; PAINTS ; POLISHES ; SEMICONDUCTOR DEVICES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; WORKING-UP</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20111215&DB=EPODOC&CC=JP&NR=2011252173A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20111215&DB=EPODOC&CC=JP&NR=2011252173A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WOO EDMUND P</creatorcontrib><creatorcontrib>WU WEISHI</creatorcontrib><creatorcontrib>INBASEKARAN MICHAEL</creatorcontrib><creatorcontrib>BERNIUS MARK T</creatorcontrib><title>FILM CONTAINING FLUORENE COPOLYMER</title><description>PROBLEM TO BE SOLVED: To provide a substance exhibiting hole transporting and electron transporting properties.SOLUTION: A film containing at least 0.1 wt.% of a copolymer containing at least 1% of a monomeric unit contains: (a) monomeric units at least 10% of which are fluorene moieties selected from 9-substituted moieties and 9,9-disubstituted fluorene moieties, or combinations thereof; (b) and two other moieties each different but containing delocalized π-electrons.</description><subject>ADHESIVES</subject><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>DYES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PAINTS</subject><subject>POLISHES</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFBy8_TxVXD29wtx9PTz9HNXcPMJ9Q9y9XMFigX4-0T6ugbxMLCmJeYUp_JCaW6gJtcQZw_d1IL8-NTigsTk1LzUknivACMDQ0MjUyNDc2NHY6IUAQCHyyL5</recordid><startdate>20111215</startdate><enddate>20111215</enddate><creator>WOO EDMUND P</creator><creator>WU WEISHI</creator><creator>INBASEKARAN MICHAEL</creator><creator>BERNIUS MARK T</creator><scope>EVB</scope></search><sort><creationdate>20111215</creationdate><title>FILM CONTAINING FLUORENE COPOLYMER</title><author>WOO EDMUND P ; WU WEISHI ; INBASEKARAN MICHAEL ; BERNIUS MARK T</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2011252173A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2011</creationdate><topic>ADHESIVES</topic><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>DYES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PAINTS</topic><topic>POLISHES</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>WOO EDMUND P</creatorcontrib><creatorcontrib>WU WEISHI</creatorcontrib><creatorcontrib>INBASEKARAN MICHAEL</creatorcontrib><creatorcontrib>BERNIUS MARK T</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WOO EDMUND P</au><au>WU WEISHI</au><au>INBASEKARAN MICHAEL</au><au>BERNIUS MARK T</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>FILM CONTAINING FLUORENE COPOLYMER</title><date>2011-12-15</date><risdate>2011</risdate><abstract>PROBLEM TO BE SOLVED: To provide a substance exhibiting hole transporting and electron transporting properties.SOLUTION: A film containing at least 0.1 wt.% of a copolymer containing at least 1% of a monomeric unit contains: (a) monomeric units at least 10% of which are fluorene moieties selected from 9-substituted moieties and 9,9-disubstituted fluorene moieties, or combinations thereof; (b) and two other moieties each different but containing delocalized π-electrons.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_epo_espacenet_JP2011252173A |
source | esp@cenet |
subjects | ADHESIVES AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G BASIC ELECTRIC ELEMENTS CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GENERAL PROCESSES OF COMPOUNDING MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS POLISHES SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP WORKING-UP |
title | FILM CONTAINING FLUORENE COPOLYMER |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-19T07%3A56%3A11IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WOO%20EDMUND%20P&rft.date=2011-12-15&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2011252173A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |