APPARATUS FOR INSPECTING OBJECT, ESPECIALLY MASK IN MICROLITHOGRAPHY

PROBLEM TO BE SOLVED: To provide an apparatus for inspecting an object such as a mask for microlithography.SOLUTION: The apparatus for inspecting an object OF such as, especially, a mask for microlithography that is present in a vacuum chamber includes a converter for converting illuminating light e...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	SEMMLER RALPH, SCHERUEBL THOMAS, ROSENKRANZ NORBERT, DOBSCHAL HANS-JUERGEN, HARNISCH WOLFGANG
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MATERIALS THEREFOR MEASURING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!