METHOD FOR MANUFACTURING REFLECTIVE MASK AND REFLECTIVE MASK BLANK USED FOR THE MANUFACTURE

PROBLEM TO BE SOLVED: To provide a method for manufacturing a reflective mask having a light-shielding region where an absorbing layer is laminated in a periphery of a pattern region, by which a defect can be corrected without leaving a correction mark while preventing decrease in the throughput of...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ABE TSUKASA, TAKIGAWA TADAHIKO, INAZUKI YUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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