IMPRINT LITHOGRAPHY

PROBLEM TO BE SOLVED: To suppress the evaporation of part of a medium to be imprinted from a substrate before the medium to be imprinted is imprinted by a template in imprint lithography. SOLUTION: A lithographic apparatus includes: a template set holder 401 to hold a plurality of imprint templates...

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Bibliographische Detailangaben
Hauptverfasser:	KRUIJT-STEGEMAN YVONNE W, WUISTER SANDER F, DIJKSMAN JOHAN F
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY PERFORMING OPERATIONS SEMICONDUCTOR DEVICES SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDEDFOR SHAPING OR JOINING OF PLASTICS TRANSPORTING WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To suppress the evaporation of part of a medium to be imprinted from a substrate before the medium to be imprinted is imprinted by a template in imprint lithography. SOLUTION: A lithographic apparatus includes: a template set holder 401 to hold a plurality of imprint templates 400; and a substrate holder to hold a substrate 403. The imprint templates 400 and the template set holder 401 are covered with a liquid layer of a silicon rich monomer by spin coating, and the template set holder 401 is arranged under the substrate holder. COPYRIGHT: (C)2011,JPO&INPIT