METHOD AND DEVICE FOR INSPECTING PATTERN DEFECTS

PROBLEM TO BE SOLVED: To solve a problem wherein a large charged potential may generate large contrast disorder on electron image formation since a charged distribution with a large potential may be generated on the whole wafer in a certain process of semiconductor manufacturing processes. SOLUTION:...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TEI TOMOKI, MAKINO HIROSHI, MURAKOSHI HISAYA, HASEGAWA MASAKI, KOYAMA HIKARI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!