EXPOSURE APPARATUS
PROBLEM TO BE SOLVED: To achieve high efficiency of exposure and to reduce the cost of an apparatus. SOLUTION: The exposure apparatus includes: a plurality of moving tables 3, which mount a plurality of substrate holding parts each holding a substrate as an exposure object member and which are confi...
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creator | IMAI KATSUKI MATSUZAKA MASAAKI |
description | PROBLEM TO BE SOLVED: To achieve high efficiency of exposure and to reduce the cost of an apparatus. SOLUTION: The exposure apparatus includes: a plurality of moving tables 3, which mount a plurality of substrate holding parts each holding a substrate as an exposure object member and which are configured to be relatively movable with respect to a mask so as to be guided by a guide shaft and individually disposed at an exposure position; a substrate carrying unit, which carries the substrate into or out of the substrate holding part not disposed at the exposure position when one of the plurality of substrate holding parts is disposed at the exposure position; and a linear motor 14 including a common stator to move the plurality of moving tables so as to move the substrate holding part at the exposure position stepwise with respect to the mask. COPYRIGHT: (C)2011,JPO&INPIT |
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SOLUTION: The exposure apparatus includes: a plurality of moving tables 3, which mount a plurality of substrate holding parts each holding a substrate as an exposure object member and which are configured to be relatively movable with respect to a mask so as to be guided by a guide shaft and individually disposed at an exposure position; a substrate carrying unit, which carries the substrate into or out of the substrate holding part not disposed at the exposure position when one of the plurality of substrate holding parts is disposed at the exposure position; and a linear motor 14 including a common stator to move the plurality of moving tables so as to move the substrate holding part at the exposure position stepwise with respect to the mask. 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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
title | EXPOSURE APPARATUS |
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