EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD FOR MANUFACTURING PANEL SUBSTRATE FOR DISPLAY

EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD FOR MANUFACTURING PANEL SUBSTRATE FOR DISPLAY

PROBLEM TO BE SOLVED: To improve quality of drawing while rendering ruggedness in a pattern edge into less noticeable. SOLUTION: A spatial optical modulator 25 of a light beam irradiation device 20 comprises a plurality of mirrors arranged in two directions perpendicular to each other and is dispose...

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1. Verfasser: MOCHIZUKI MASAAKI
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Sprache:eng
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APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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creator MOCHIZUKI MASAAKI
description PROBLEM TO BE SOLVED: To improve quality of drawing while rendering ruggedness in a pattern edge into less noticeable. SOLUTION: A spatial optical modulator 25 of a light beam irradiation device 20 comprises a plurality of mirrors arranged in two directions perpendicular to each other and is disposed as inclined with respect to the scanning direction on a substrate 1 with a light beam. A drawing control unit changes coordinates of drawing data in accordance with the inclination of the spatial optical modulator 25 of the light beam irradiation device 20. An edge correcting circuit irregularly changes positions for changing coordinates of the drawing data to irregularly change edges of a pattern to be drawn on a substrate 1. Compared with a process of regularly changing edges of a pattern in a stepwise manner, ruggedness in a pattern edge is less noticeable. The method requires no process of newly creating a drawing data for correcting a pattern edge, but allows real-time pattern edge correction. COPYRIGHT: (C)2011,JPO&INPIT
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SOLUTION: A spatial optical modulator 25 of a light beam irradiation device 20 comprises a plurality of mirrors arranged in two directions perpendicular to each other and is disposed as inclined with respect to the scanning direction on a substrate 1 with a light beam. A drawing control unit changes coordinates of drawing data in accordance with the inclination of the spatial optical modulator 25 of the light beam irradiation device 20. An edge correcting circuit irregularly changes positions for changing coordinates of the drawing data to irregularly change edges of a pattern to be drawn on a substrate 1. Compared with a process of regularly changing edges of a pattern in a stepwise manner, ruggedness in a pattern edge is less noticeable. The method requires no process of newly creating a drawing data for correcting a pattern edge, but allows real-time pattern edge correction. 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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title EXPOSURE APPARATUS, EXPOSURE METHOD AND METHOD FOR MANUFACTURING PANEL SUBSTRATE FOR DISPLAY
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