NOZZLE FOR SUBSTRATE ANALYSIS, AND SUBSTRATE ANALYSIS METHOD

PROBLEM TO BE SOLVED: To provide a nozzle for substrate analysis from which analysis liquid hardly falls out during sweeping, though being put into a sweeping-possible state in a short time, which is suitable for analysis of a substrate including a film of polysilicon or the like, or for analysis of...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LEE SUNJE, KAWABATA KATSUHIKO, KUNIKA JIN, ICHINOSE TATSUYA
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!