NOZZLE FOR SUBSTRATE ANALYSIS, AND SUBSTRATE ANALYSIS METHOD

NOZZLE FOR SUBSTRATE ANALYSIS, AND SUBSTRATE ANALYSIS METHOD

PROBLEM TO BE SOLVED: To provide a nozzle for substrate analysis from which analysis liquid hardly falls out during sweeping, though being put into a sweeping-possible state in a short time, which is suitable for analysis of a substrate including a film of polysilicon or the like, or for analysis of...

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Hauptverfasser: LEE SUNJE, KAWABATA KATSUHIKO, KUNIKA JIN, ICHINOSE TATSUYA
Format: Patent
Sprache:eng
Schlagworte:
INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
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creator LEE SUNJE
KAWABATA KATSUHIKO
KUNIKA JIN
ICHINOSE TATSUYA
description PROBLEM TO BE SOLVED: To provide a nozzle for substrate analysis from which analysis liquid hardly falls out during sweeping, though being put into a sweeping-possible state in a short time, which is suitable for analysis of a substrate including a film of polysilicon or the like, or for analysis of a substrate itself of a silicon wafer or the like. SOLUTION: This nozzle for substrate analysis, which is constituted of a double tube comprising a nozzle body for discharging and sucking analysis liquid and an outer tube arranged on the outer periphery of the nozzle body so as to enclose the sweeping analysis liquid, has an exhaust means using a clearance between the nozzle body and the outer tube as an exhaust route, and an outside air introduction hole on the distal end of the outer tube. COPYRIGHT: (C)2011,JPO&INPIT
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subjects INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES
MEASURING
PHYSICS
TESTING
title NOZZLE FOR SUBSTRATE ANALYSIS, AND SUBSTRATE ANALYSIS METHOD
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