INKJET WIPING APPARATUS AND WIPING METHOD USING THE SAME
PROBLEM TO BE SOLVED: To provide a wiping apparatus capable of forming a gas flow that is parallel to a nozzle plate and is stable, without coming into contact with the nozzle plate. SOLUTION: The wiping apparatus has a gas injection aperture that injects gas, and a guide section that has a projecti...
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | KANEDA YOSHIO MURO SHINKO |
| description | PROBLEM TO BE SOLVED: To provide a wiping apparatus capable of forming a gas flow that is parallel to a nozzle plate and is stable, without coming into contact with the nozzle plate. SOLUTION: The wiping apparatus has a gas injection aperture that injects gas, and a guide section that has a projectingly curved surface which has an apex and over which gas injected from the gas injection aperture is blown. In the wiping apparatus, foreign substances adhering to the nozzle plate of an inkjet head placed above the guide section is blown away by gas guided along the curved surface of the guide section. COPYRIGHT: (C)2011,JPO&INPIT |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2011088133A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2011088133A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2011088133A3</originalsourceid><addsrcrecordid>eNrjZLDw9PP2cg1RCPcM8PRzV3AMCHAMcgwJDVZw9HOBCfq6hnj4uyiEBoM4IR6uCsGOvq48DKxpiTnFqbxQmptByc01xNlDN7UgPz61uCAxOTUvtSTeK8DIwNDQwMLC0NjY0ZgoRQCneCi8</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>INKJET WIPING APPARATUS AND WIPING METHOD USING THE SAME</title><source>esp@cenet</source><creator>KANEDA YOSHIO ; MURO SHINKO</creator><creatorcontrib>KANEDA YOSHIO ; MURO SHINKO</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a wiping apparatus capable of forming a gas flow that is parallel to a nozzle plate and is stable, without coming into contact with the nozzle plate. SOLUTION: The wiping apparatus has a gas injection aperture that injects gas, and a guide section that has a projectingly curved surface which has an apex and over which gas injected from the gas injection aperture is blown. In the wiping apparatus, foreign substances adhering to the nozzle plate of an inkjet head placed above the guide section is blown away by gas guided along the curved surface of the guide section. COPYRIGHT: (C)2011,JPO&INPIT</description><language>eng</language><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; CLEANING ; CLEANING IN GENERAL ; CORRECTION OF TYPOGRAPHICAL ERRORS ; i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME ; LINING MACHINES ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; PRINTING ; PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL ; SELECTIVE PRINTING MECHANISMS ; SPRAYING OR ATOMISING IN GENERAL ; STAMPS ; TRANSPORTING ; TYPEWRITERS</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110506&DB=EPODOC&CC=JP&NR=2011088133A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110506&DB=EPODOC&CC=JP&NR=2011088133A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KANEDA YOSHIO</creatorcontrib><creatorcontrib>MURO SHINKO</creatorcontrib><title>INKJET WIPING APPARATUS AND WIPING METHOD USING THE SAME</title><description>PROBLEM TO BE SOLVED: To provide a wiping apparatus capable of forming a gas flow that is parallel to a nozzle plate and is stable, without coming into contact with the nozzle plate. SOLUTION: The wiping apparatus has a gas injection aperture that injects gas, and a guide section that has a projectingly curved surface which has an apex and over which gas injected from the gas injection aperture is blown. In the wiping apparatus, foreign substances adhering to the nozzle plate of an inkjet head placed above the guide section is blown away by gas guided along the curved surface of the guide section. COPYRIGHT: (C)2011,JPO&INPIT</description><subject>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>CORRECTION OF TYPOGRAPHICAL ERRORS</subject><subject>i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME</subject><subject>LINING MACHINES</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>PRINTING</subject><subject>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</subject><subject>SELECTIVE PRINTING MECHANISMS</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>STAMPS</subject><subject>TRANSPORTING</subject><subject>TYPEWRITERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLDw9PP2cg1RCPcM8PRzV3AMCHAMcgwJDVZw9HOBCfq6hnj4uyiEBoM4IR6uCsGOvq48DKxpiTnFqbxQmptByc01xNlDN7UgPz61uCAxOTUvtSTeK8DIwNDQwMLC0NjY0ZgoRQCneCi8</recordid><startdate>20110506</startdate><enddate>20110506</enddate><creator>KANEDA YOSHIO</creator><creator>MURO SHINKO</creator><scope>EVB</scope></search><sort><creationdate>20110506</creationdate><title>INKJET WIPING APPARATUS AND WIPING METHOD USING THE SAME</title><author>KANEDA YOSHIO ; MURO SHINKO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2011088133A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2011</creationdate><topic>APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>CORRECTION OF TYPOGRAPHICAL ERRORS</topic><topic>i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME</topic><topic>LINING MACHINES</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>PRINTING</topic><topic>PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL</topic><topic>SELECTIVE PRINTING MECHANISMS</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>STAMPS</topic><topic>TRANSPORTING</topic><topic>TYPEWRITERS</topic><toplevel>online_resources</toplevel><creatorcontrib>KANEDA YOSHIO</creatorcontrib><creatorcontrib>MURO SHINKO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KANEDA YOSHIO</au><au>MURO SHINKO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>INKJET WIPING APPARATUS AND WIPING METHOD USING THE SAME</title><date>2011-05-06</date><risdate>2011</risdate><abstract>PROBLEM TO BE SOLVED: To provide a wiping apparatus capable of forming a gas flow that is parallel to a nozzle plate and is stable, without coming into contact with the nozzle plate. SOLUTION: The wiping apparatus has a gas injection aperture that injects gas, and a guide section that has a projectingly curved surface which has an apex and over which gas injected from the gas injection aperture is blown. In the wiping apparatus, foreign substances adhering to the nozzle plate of an inkjet head placed above the guide section is blown away by gas guided along the curved surface of the guide section. COPYRIGHT: (C)2011,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JP2011088133A |
| source | esp@cenet |
| subjects | APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL CLEANING CLEANING IN GENERAL CORRECTION OF TYPOGRAPHICAL ERRORS i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME LINING MACHINES PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL PRINTING PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SELECTIVE PRINTING MECHANISMS SPRAYING OR ATOMISING IN GENERAL STAMPS TRANSPORTING TYPEWRITERS |
| title | INKJET WIPING APPARATUS AND WIPING METHOD USING THE SAME |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T12%3A50%3A00IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KANEDA%20YOSHIO&rft.date=2011-05-06&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2011088133A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |