METHOD FOR DESIGNING PHOTOMASK AND DESIGN PROGRAM OF PHOTOMASK

PROBLEM TO BE SOLVED: To provide a method for designing a photomask and a design program of a photomask, capable of appropriately arranging an assist pattern. SOLUTION: The method for designing a photomask includes procedures of: arranging a plurality of evaluation patterns around a design pattern;...

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Bibliographische Detailangaben

1. Verfasser:	KAI YASUNOBU
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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