METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE

PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device that uniformizes device characteristics by a simple process, and to provide a semiconductor integrated circuit device. SOLUTION: The method of manufacturing the semiconductor device includes: a LOCOS oxide film forming...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	KASAHARA MASAKI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
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